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William A. Eckes
Principal Engineer at Eckes Consulting
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Publications (1)
Proceedings Article | 28 July 1997 Paper
Multipass gray printing for the new MEBES 4500S mask lithography system
Frank Abboud, Robert Dean, Janine Doering, W. Eckes, Mark Gesley, Ulrich Hofmann, Terry Mulera, Robert Naber, M. Pastor, Wayne Phillips, John Raphael, Frederick Raymond, Charles Sauer
Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277295
KEYWORDS: Printing, Control systems, Photomasks, Lithography, Electron beam lithography, Reticles, Temperature metrology, Laser scattering, Scattering, Modulation
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