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Bob Rollinger
at ASML San Diego
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Publications (1)
Proceedings Article | 10 April 2024 Presentation + Paper
High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools
Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane Matthes, Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan, Peter Mayer, Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma, Daniel Brown
Proceedings Volume 12953, 129530V (2024) https://doi.org/10.1117/12.3010463
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Carbon monoxide, Light sources, Tin, Semiconducting wafers, Scattering, Scanners, Gas lasers
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