We exploit micro-nano structuration to achieve multifunctional windows offering outstanding optical and fluidic properties to enhance the operation of surveillance or detection devices under rainy conditions. These windows are based on synthesis of an artificial index gradient for antireflection properties and improvement of their water repellency property thanks to their structuration at a subwavelength scale with controlled conical geometries. We demonstrate the realization of multifunctional germanium windows for LWIR camera, using two approaches: nanoimprint lithography, well-known for its very high resolution enabling applications from visible to thermal infrared domain, followed by etching techniques, and 3D direct laser writing based on Two-Photon Polymerization (TPP), which is of interest thanks to its ability to manufacture complex 3D structuration directly. Optical characterization shows the ability of such windows to improve optical transmission within 8-14μm spectral range, as compared to non-structured window. In terms of water repellency, the structured windows enable an increase of the contact angle up to 160° with a very low hysteresis. To evaluate the advantage of the multifunctional windows for imaging devices, the windows are integrated in front of a thermal infrared camera and images analysis shows that the camera sensitivity is increased for the nanoimprint window thanks to the multifunctional window and high water repellency in presence of water.
Two-photon polymerization is a photochemical process usually initiated by tightly focusing an ultrafast laser pulse into a volume of photosensitive photoresists with a high-numerical-aperture objective. Scanning a write voxel" in 3D enables near free-form fabrication, but at a limited speed which is a critical factor for industrial purposes, because generally only a single writing-beam is used. Several strategies have been implemented to improve the fabrication speed, one such strategy is massive parallelization which is the approach used in our PHENOmenon H2020 European project. Massive parallelization can be realized by beam splitting diffractive optical elements which allow simultaneous fabrication with thousands of beams, decreasing the overall fabrication time. A major unexpected obstacle is encountered in massively parallelized fabrication: using several spots simultaneously to polymerize, local changes in the 2PP threshold have been observed. We linked this to the proximity effect. The aim of this study is to understand the proximity effect in parallel microfabrication using simulation to predict its behaviour and different systematic experiments to reduce the proximity effect such as changing photoresist, using thinner photoresist layers to increase oxygen penetration or using higher Numerical Aperture Objectives.
The use of two-photon absorption (TPA) for polymerization, also known as 3D Lithography, Direct Laser Writing, or High-Precision 3D Printing is gaining increasing attraction in industrial fabrication of micro- and nanostructures. Mainly due to its vast freedom in design and high-resolution capabilities, TPA enables the fabrication of designs which are not feasible or far too complicated to be achieved with conventional fabrication methods. TPA is a scanning technology and fabrication in 3D requires axial overwritings. High industrial throughput fabrication can be achieved by intelligent fabrication strategies combined with an excellent material basis. Further boosting the throughput can be achieved by multispot exposure strategies. In this paper, massive parallelization is demonstrated which was realized by using a beam splitting diffractive optical element (DOE). Simultaneous fabrication using commercially available acrylate-based hybrid resin with 121 parallel focal spots arranged as 11 x 11 array is reported. Structures fabricated by a single laser beam and by 121 parallel beams are compared to each other with regard to shape and polymerization threshold. It was found that polymerization is strongly increased when parallel beams are used, especially for the central beams. As a result, polymerization threshold is lower in the center of the 11 x 11 array compared to the edges of the array. Furthermore, structures at the center of the 11 x 11 array are bigger compared to structures at the edges of the array when assigning equal intensity to all diffracted beams. These results are attributed to diffusion of photo initiators, quenchers, and radicals.
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