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Prof. Cetin Cetinkaya
at Clarkson Univ
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Publications (1)
Proceedings Article | 20 May 2006 Paper
Nanoparticle removal from EUV photomasks using laser induced plasma shockwaves
John Kadaksham, Dong Zhou, M. D. Murthy Peri, Ivin Varghese, Florence Eschbach, Cetin Cetinkaya
Proceedings Volume 6283, 62833C (2006) https://doi.org/10.1117/12.681831
KEYWORDS: Particles, Nanoparticles, Laser induced plasma spectroscopy, Photomasks, Plasma, Extreme ultraviolet lithography, Spherical lenses, Resistance, Scanning electron microscopy, Silicon
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