David W. Myers
Vice President EUV Development at Cymer LLC
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904835 (2014) https://doi.org/10.1117/12.2048195
KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

Proceedings Article | 18 March 2014 Paper
Proceedings Volume 9048, 90480C (2014) https://doi.org/10.1117/12.2048184
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792I (2013) https://doi.org/10.1117/12.2012695
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Plasma, Light sources, Carbon dioxide lasers, Neodymium, Optical lithography, Laser development, Metrology

Proceedings Article | 1 April 2013 Paper
David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich
Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

SPIE Journal Paper | 29 June 2012
Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko
JM3, Vol. 11, Issue 02, 021110, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021110
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 25 publications
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