Ms. Fong-Yi Ciou Profile

Fong-Yi Ciou

at National Sun Yat-Sen Univ

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Proceedings Article | 9 March 2015 Paper

Investigation of uniformity field generated from freeform lens with UV LED exposure system

F. Y. Ciou, Yi-Chian Chen, C. T. Pan, Po-Hung Lin, Po-Hsun Lin, F. T. Hsu

Proceedings Volume 9383, 93830S (2015) https://doi.org/10.1117/12.2077938

KEYWORDS: Lamps, Ultraviolet radiation, Mercury, Light emitting diodes, Ultraviolet light emitting diodes, Light sources, Refraction, Light, Lens design, Refractive index

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In the exposure process, the intensity and uniformity of light in the exposure area directly influenced the precision of products. UV-LED (Ultraviolet Light-Emitting Diode) exposure system was established to reduce the radiation leakage and increase the energy efficiency for energy saving. It is a trend that conventional mercury lamp could be replaced with UV-LED exposure system. This study was based on the law of conservation of energy and law of refraction of optical field distributing on the target plane. With these, a freeform lens with uniform light field of main exposure area could be designed. The light outside the exposure area could be concentrated into the area to improve the intensity of light. The refraction index and UV transmittance of Polydimethylsiloxane (PDMS) is 1.43 at 385 nm wavelength and 85-90%, respectively. The PDMS was used to fabricate the optics lens for UV-LEDs. The average illumination and the uniformity could be obtained by increasing the number of UV-LEDs and the spacing of different arrangement modes. After exposure process with PDMS lens, about 5% inaccuracy was obtained. Comparing to 10% inaccuracy of general exposure system, it shows that it is available to replace conventional exposure lamp with using UV-LEDs.

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