Prof. Guoqiang Yang Profile

Prof. Guoqiang Yang

at Institute of Chemistry

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Publications (1)

SPIE Journal Paper | 2 June 2022

Water developable non-chemically amplified photoresist for electron beam and extreme ultraviolet lithography

Zhihao Wang, Jinping Chen, Tianjun Yu, Yi Zeng, Guoqiang Yang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci, Yi Li

JM3, Vol. 21, Issue 04, 041403, (June 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041403

KEYWORDS: Photoresist materials, Electron beam lithography, Extreme ultraviolet lithography, Photoresist developing, Lithography, Electron beams, Polymers, Scanning electron microscopy, Line edge roughness, Polymethylmethacrylate

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