Hiromi Hoshino
at Fujitsu Semiconductor Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 26 March 2013 Paper
Takashi Maruyama, Hiroshi Takita, Rimon Ikeno, Morimi Osawa, Yoshinori Kojima, Shinji Sugatani, Hiromi Hoshino, Toshio Hino, Masaru Ito, Tetsuya Iizuka, Satoshi Komatsu, Makoto Ikeda, Kunihiro Asada
Proceedings Volume 8680, 868027 (2013) https://doi.org/10.1117/12.2011678
KEYWORDS: Logic, Analog electronics, Semiconducting wafers, Mirrors, Metals, High volume manufacturing, Logic devices, System on a chip, Electron beam direct write lithography, Lithium

SPIE Journal Paper | 7 August 2012
Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon
JM3, Vol. 11, Issue 3, 031403, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031403
KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

Proceedings Article | 21 March 2012 Paper
Proceedings Volume 8323, 832328 (2012) https://doi.org/10.1117/12.916353
KEYWORDS: Scattering, Backscatter, Laser scattering, Critical dimension metrology, Electron beams, Modulation, Photomasks, Logic, Electron beam direct write lithography, Lithography

Proceedings Article | 21 March 2012 Paper
Jun-ichi Kon, Takashi Maruyama, Yoshinori Kojima, Yasushi Takahashi, Shinji Sugatani, Kozo Ogino, Hiromi Hoshino, Hideaki Isobe, Masaki Kurokawa, Akio Yamada
Proceedings Volume 8323, 832324 (2012) https://doi.org/10.1117/12.916305
KEYWORDS: Diffusion, Chemically amplified resists, Lithography, Manufacturing, Optical lithography, Photoresist processing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Beam analyzers

Proceedings Article | 21 March 2012 Paper
Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon
Proceedings Volume 8323, 832326 (2012) https://doi.org/10.1117/12.916338
KEYWORDS: Electron beam direct write lithography, Optical alignment, Electron beams, Control systems, Semiconducting wafers, Overlay metrology, Metals, Photoresist processing, Backscatter, Electron beam lithography

Showing 5 of 12 publications
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