Dr. Hyun Wook Ro Profile

Dr. Hyun Wook Ro

at National Institute of Standards and Technology

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 18 March 2009 Paper

In situ measurement of annealing-induced line shape evolution in nanoimprinted polymers using scatterometry

Heather Patrick, Thomas Germer, Yifu Ding, Hyun Wook Ro, Lee Richter, Christopher Soles

Proceedings Volume 7271, 727128 (2009) https://doi.org/10.1117/12.815360

KEYWORDS: Scatterometry, Data modeling, Annealing, Polymers, Ellipsometry, Solids, Atomic force microscopy, Nanoimprint lithography, In situ metrology, Statistical modeling

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Proceedings Article | 28 March 2008 Paper

Porosity characteristics of ultra-low dielectric insulator films directly patterned by nano-imprint lithography

Hyun Wook Ro, Ronald Jones, Huagen Peng, Hae-Jeong Lee, Eric Lin, Alamgir Karim, Do Yoon, David Gidley, Christopher Soles

Proceedings Volume 6921, 69211M (2008) https://doi.org/10.1117/12.773004

KEYWORDS: Dielectrics, Reflectivity, Picosecond phenomena, Nanoimprint lithography, X-rays, Skin, Scattering, Optical lithography, Electron beam lithography, Silicon

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Proceedings Article | 5 April 2007 Paper

Characterizing pattern structures using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Wook Ro, Shuhui Kang, Eric Lin, Alamgir Karim, Wen-li Wu, D. Hines

Proceedings Volume 6518, 651813 (2007) https://doi.org/10.1117/12.712416

KEYWORDS: X-rays, Reflectivity, Silicon, Data modeling, Metrology, X-ray sources, Scattering, Nanoimprint lithography, Lithography, Laser scattering

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Proceedings Article | 15 March 2007 Paper

Nanoimprint lithography for the direct patterning of nanoporous interlayer dielectric insulator materials

Hyun Wook Ro, Hae-Jeong Lee, Eric Lin, Alamgir Karim, Daniel Hines, Do Yoon

Proceedings Volume 6517, 651715 (2007) https://doi.org/10.1117/12.712347

KEYWORDS: Nanoimprint lithography, Dielectrics, Reflectivity, Optical lithography, X-rays, Silicon, Semiconductors, Thin films, Electron beam lithography, Lithography

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Proceedings Article | 23 March 2006 Paper

Characterizing nanoimprint pattern cross-section and fidelity from x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Ro, D. Hines, Ronald Jones, Eric Lin, Alamgir Karim, Wen-li Wu

Proceedings Volume 6151, 61510N (2006) https://doi.org/10.1117/12.656826

KEYWORDS: Silicon, Reflectivity, X-rays, Data modeling, Nanoimprint lithography, Oxides, Scattering, Semiconducting wafers, Nanostructures, Reactive ion etching

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Proceedings Article | 23 March 2006 Paper

The role of stress in nanoimprint lithography

Hyun Ro, Yifu Ding, Hae-Jeong Lee, Daniel Hines, Ronald Jones, Eric Lin, Alamgir Karim, Wen-li Wu, Christopher Soles

Proceedings Volume 6151, 615116 (2006) https://doi.org/10.1117/12.656742

KEYWORDS: Polymers, Polymethylmethacrylate, Nanoimprint lithography, Annealing, Scattering, X-rays, Temperature metrology, Picosecond phenomena, Nanostructures, Reflectivity

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Proceedings Article | 6 May 2005 Paper

High-resolution residual layer thickness metrology using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Ro, Daniel Hines, Ronald Jones, Eric Lin, Wen-li Wu

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600004

KEYWORDS: Reflectivity, Silicon, X-rays, Data modeling, Metrology, Nanoimprint lithography, Scattering, Reactive ion etching, Scanning electron microscopy, Semiconducting wafers

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Showing 5 of 7 publications

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