Mr. Jeff D. Hunker Profile

Jeff D. Hunker

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Author

Publications (5)

Proceedings Article | 8 March 2014 Paper

Precision alignment of integrated optics in surface electrode ion traps for quantum information processing

Amber Young, Jeffrey Hunker, A. Robert Ellis, Sally Samora, Joel Wendt, Daniel Stick

Proceedings Volume 8989, 89890L (2014) https://doi.org/10.1117/12.2040795

KEYWORDS: Optical alignment, Ions, Epoxies, Silica, Zone plates, Semiconducting wafers, Integrated optics, Electrodes, Luminescence, Wavefronts

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Proceedings Article | 5 March 2013 Paper

Flexible conductive polymer polarizer designed for a chemical tag

C. Washburn, J. Jones, S. Vigil, P. Finnegan, R. Boye, J. Hunker, D. Scrymgeour, S. Dirk, B. Hance, J. Strong, L. Massey, M. Brumbach

Proceedings Volume 8613, 861312 (2013) https://doi.org/10.1117/12.2005247

KEYWORDS: Polymers, Silicon, Fluorine, Polarizers, Polarization, Composites, Etching, Deep reactive ion etching, Semiconducting wafers, Titanium dioxide

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Proceedings Article | 5 March 2013 Paper

Micro-optical grayscale excitation lenses for atom and ion trapping

D. Scrymgeour, S. Kemme, R. Boye, A. Ellis, T. Carter, S. Samora, Jeffery Hunker

Proceedings Volume 8613, 861313 (2013) https://doi.org/10.1117/12.2004992

KEYWORDS: Ions, Lenses, Etching, Silica, Light scattering, Photoresist materials, Scattering, Micro optics, Photomasks, Lens design

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Proceedings Article | 8 February 2012 Paper

High precision fabrication of polarization insensitive resonant grating filters

R. Boye, D. Peters, J. Wendt, S. Samora, J. Stevens, R. Shul, J. Hunker, R. Kellogg, S. Kemme

Proceedings Volume 8249, 82490C (2012) https://doi.org/10.1117/12.912169

KEYWORDS: Etching, Computer programming, Waveguides, Optical design, Silicon, Tolerancing, Semiconducting wafers, Silica, Polarization, Titanium dioxide

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Proceedings Article | 12 February 2010 Paper

High speed optical filtering using active resonant subwavelength gratings

A. Gin, S. Kemme, R. Boye, D. Peters, J. Ihlefeld, R. Briggs, J. Wendt, A. R. Ellis, L. Marshall, T. Carter, J. Hunker, S. Samora

Proceedings Volume 7604, 76040N (2010) https://doi.org/10.1117/12.842681

KEYWORDS: Ferroelectric materials, Electro optical modeling, Metals, Electrodes, Refractive index, Optical filters, Reflectivity, Electro optics, Thin films, Silica

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