We have built and tested a laser induced desorption (LID), electron impact ionization, time-of-flight (TOF) mass spectrometer (MS) designed to nondestructively identify and measure adsorbed contaminants on critical surfaces for the microelectronics and optics industries. The LID-TOFMS combines the capability of a TOF mass spectrometer to measure all the desorbed molecules from a single laser shot with an infrared Er:YAG laser (2.94 micron), which is not strongly absorbed by many transparent optical materials but is strongly absorbed by water, the most common adsorbed surface contaminant, to yield surface composition as a function of position on the sample. The LID-TOFMS was calibrated using an oxalic acid film on a polished stainless steel plate, which also contained adsorbed water. Contaminants on CaF2 surfaces measured by LID-TOFMS include water and hydrocarbons. Desorbed molecules decrease with increasing irradiations at a fixed laser fluence, suggesting that the surface is being cleaned.
A water-soluble black photopolymer, containing PVA-SbQ, carbon black, surfactants and solvent, was developed for production of blackmatrix. Blackmatrix made from the black photopolymer has high opacity and good resolution. The negative charged carbon black is more suitable to be used as the light shielding substance. Several methods to shorten the exposure time were studied and discussed. Increasing the content of photosensitive group and exposed by lamp of high irradiation intensity are effective methods to shorten the exposure time. The fabrication of BM using this black photopolymer has some advantages over conventional methods: low cost, low light reflectivity and low pollution.
Water-soluble pigment-dispersed resist systems of red, blue, and green were developed using a high polymer as dispersing agent. The color filters formed from the color resists have high photosensitivity, high resolution, high transparency and chromaticity that meets the requirements of color display. The formation of microimage depends not only on the degree of photo-crosslink of polyvinyl alcohol/stylpyridinium, but also on the adhesion of color filter to the glass substrate. The reduction of photoreaction speed of the color resists is caused by the pigments' absorption of UV light. The adhesion between the color filter and glass surface depends on the amount of hydrogen bonds formed between them.
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