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JoonHee Han
Senior Researcher at Kumho Petrochemical Co., Ltd.
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Publications (5)
Proceedings Article | 17 April 2014 Paper
The factors affecting improvement sensitivity, CDU, and resolution in EUV resist
Joonhee Han, Hyun Soon Lim, Jin Ho Kim, Sumi Choi, Jin Bong Shin, Chang Wan Bae, In Young Yoo, Bong Ha Shin, Eun Kyo Lee, Hyun Sang Joo, Dong Chul Seo, Jun Sung Chun
Proceedings Volume 9048, 90482R (2014) https://doi.org/10.1117/12.2046573
KEYWORDS: Polymers, Extreme ultraviolet, Lithography, Polymer thin films, Electroluminescence, Extreme ultraviolet lithography, Palladium, Line width roughness, Diffusion, Scanning electron microscopy
Proceedings Article | 1 April 2013 Paper
The study of novel PAG containing acid amplifier in EUV resist material
Hyun Sang Joo, Jin Ho Kim, Joon Hee Han, Chang Wan Bae, Jin Bong Shin, Hyun Soon Lim, Seung Duk Cho, Sam Min Kim
Proceedings Volume 8679, 86792Z (2013) https://doi.org/10.1117/12.2010861
KEYWORDS: Polymers, Extreme ultraviolet, Diffusion, Amplifiers, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Chemical species, Yield improvement, Sodium
Proceedings Article | 23 March 2012 Paper
The factor affecting LWR and sensitivity in EUV resist material
Joonhee Han, Jin Bong Shin, Yong Hwa Hong, So Jung Park, Hyun Soon Lim, Hyun Sang Joo, Sam Min Kim, Dong Chul Seo
Proceedings Volume 8322, 83222B (2012) https://doi.org/10.1117/12.916025
KEYWORDS: Line width roughness, Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Diffusion, Electron beam lithography, Lithography, Light sources, Semiconducting wafers, Oxygen
Proceedings Article | 8 April 2011 Paper
Study of acid diffusion of anionic or cationic polymer bound PAG
Jin Bong Shin, Hyun Sang Joo, Seung Duk Cho, Hyun Soon Lim, Jin Ho Kim, Seung Jae Lee, Dae Hyeon Shin, JoonHee Han, Dong Chul Seo
Proceedings Volume 7969, 79692N (2011) https://doi.org/10.1117/12.870702
KEYWORDS: Diffusion, Polymers, Line edge roughness, Extreme ultraviolet, Photoresist materials, Semiconducting wafers, Edge roughness, Extreme ultraviolet lithography, Lithography, Silicon
Proceedings Article | 4 December 2008 Paper
The noble resists composed of cationic and anionic polymerizable PAGs
Jung Hoon Oh, Dong Chul Seo, Hyun Sang Joo, Sung Do Jung, Jin Ho Kim, Seung Jae Lee, Ran Ra Park, JoonHee Han, Joo Hyeon Park
Proceedings Volume 7140, 714031 (2008) https://doi.org/10.1117/12.804631
KEYWORDS: Polymers, Polymerization, Lithography, Diffusion, Extreme ultraviolet, Glasses, Photoresist materials, Sodium, Line edge roughness, Etching
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