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Keisuke Chiba
at KIOXIA Corp
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 29 September 2019 Presentation + Paper
Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer
Proceedings Volume 11148, 111480X (2019) https://doi.org/10.1117/12.2536474
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Line width roughness, Signal to noise ratio, Deep ultraviolet, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet lithography
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