Dr. Keven Yu Profile

Dr. Keven Yu

Key Account Technologist at Applied Materials Inc

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Author

Publications (10)

Proceedings Article | 23 October 2015 Paper

Photomask etch system and process for 10nm technology node and beyond

Madhavi Chandrachood, Michael Grimbergen, Keven Yu, Toi Leung, Jeffrey Tran, Jeff Chen, Darin Bivens, Rao Yalamanchili, Richard Wistrom, Tom Faure, Peter Bartlau, Shaun Crawford, Yoshifumi Sakamoto

Proceedings Volume 9635, 963516 (2015) https://doi.org/10.1117/12.2199030

KEYWORDS: Etching, Photomasks, Opacity, Chromium, Critical dimension metrology, Process control, Phase shifts, Photoresist processing, Line edge roughness, Phase modulation

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Proceedings Article | 1 October 2013 Paper

Model-based etch profile simulation of PSM films

Michael Grimbergen, Madhavi Chandrachood, Jeffrey Tran, Becky Leung, Keven Yu, Amitabh Sabharwal, Ajay Kumar

Proceedings Volume 8880, 88800X (2013) https://doi.org/10.1117/12.2029006

KEYWORDS: Etching, Photoresist materials, Ions, Chromium, Reactive ion etching, Model-based design, Photomasks, Solids, Plasma, Silicon

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Proceedings Article | 8 November 2012 Paper

Photomask etch: addressing the resist challenges for advanced phase-shift and binary photomasks

Michael Grimbergen, Madhavi Chandrachood, Keven Yu, Toi Yue Leung, Amitabh Sabharwal, Ajay Kumar

Proceedings Volume 8522, 85222M (2012) https://doi.org/10.1117/12.981215

KEYWORDS: Etching, Photomasks, Photoresist materials, Binary data, Data modeling, Signal processing, Plasma etching, Lithography, Wave propagation, Plasma

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Proceedings Article | 14 October 2011 Paper

Dry etching performance of advanced EUV mask blanks

John Whang, Madhavi Chandrachood, Emily Gallagher, Tom Faure, Michael Grimbergen, Shaun Crawford, Keven Yu, T. Y .B Leung, Richard Wistrom, Amitabh Sabharwal, Jeff Chen, Banqiu Wu

Proceedings Volume 8166, 81661W (2011) https://doi.org/10.1117/12.898815

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Ruthenium, Line edge roughness, Multilayers, Binary data, Manufacturing, Extreme ultraviolet lithography, Tantalum

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Proceedings Article | 6 November 2009 Paper

Plasma characterization of Tetra III chrome etch system

Michael Grimbergen, D. G. Nest, Keven Yu, T. Y. Leung, Madhavi Chandrachood, Alan Ouye, Saravjeet Singh, Ibrahim Ibrahim, Ajay Kumar, David Graves

Proceedings Volume 7488, 74880L (2009) https://doi.org/10.1117/12.833490

KEYWORDS: Plasma, Ions, Etching, Electrodes, Argon, Chlorine, Plasma etching, Emission spectroscopy, Ceramics, Ultraviolet radiation

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Proceedings Article | 2 May 2008 Paper

Overcoming mask etch challenges for 45 nm and beyond

M. Chandrachood, T. Y. Leung, K. Yu, M. Grimbergen, S. Panayil, I. Ibrahim, A. Sabharwal, A. Kumar

Proceedings Volume 6792, 67920S (2008) https://doi.org/10.1117/12.798810

KEYWORDS: Etching, Photomasks, Chromium, Infrared search and track, Critical dimension metrology, Reactive ion etching, Optical proximity correction, Ions, Particles, Quartz

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Proceedings Article | 30 October 2007 Paper

Overcoming loading challenges in a mask etcher for 45 nm and beyond

M. Chandrachood, T. Y. Leung, K. Yu, M. Grimbergen, S. Panayil, I. Ibrahim, A. Sabharwal, A. Kumar

Proceedings Volume 6730, 673046 (2007) https://doi.org/10.1117/12.763351

KEYWORDS: Etching, Photomasks, Chromium, Infrared search and track, Critical dimension metrology, Reactive ion etching, Optical proximity correction, Ions, Particles, Quartz

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Proceedings Article | 19 May 2006 Paper

Photomask etch challenges for future technology nodes

Madhavi Chandrachood, Michael Grimbergen, Toi Yue Leung, Keven Yu, Renee Koch, Jeff Chen, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62830C (2006) https://doi.org/10.1117/12.684417

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Reactive ion etching, Resolution enhancement technologies, Quartz, Control systems, Plasma etching, Phase shifts

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Proceedings Article | 30 August 1999 Paper

Deep anisotropic ICP plasma etching designed for high-volume MEMS manufacturing

Keven Yu, Michael Feldbaum, Tam Pandhumsoporn, Prashant Gadgil

Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361224

KEYWORDS: Etching, Silicon, Microelectromechanical systems, Semiconducting wafers, Photomasks, Plasma etching, Plasma, Oxides, Scanning electron microscopy, Manufacturing

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Proceedings Article | 19 September 1995 Paper

Etching technology and applications for through-the-wafer silicon etching

David Craven, Keven Yu, Tam Pandhumsoporn

Proceedings Volume 2639, (1995) https://doi.org/10.1117/12.221296

KEYWORDS: Etching, Silicon, Anisotropic etching, Plasma etching, Chemistry, Semiconducting wafers, Technologies and applications, Plasma, Micromachining, Process control

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Showing 5 of 10 publications

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