Koichiro Tanaka
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 5 September 2018
Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox
JM3, Vol. 18, Issue 01, 011006, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011006
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

Proceedings Article | 28 March 2018 Presentation + Paper
Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox
Proceedings Volume 10583, 105830E (2018) https://doi.org/10.1117/12.2297362
KEYWORDS: Inspection, Semiconducting wafers, Etching, Stochastic processes, Extreme ultraviolet, Modulation, Defect detection, Extreme ultraviolet lithography, Coating, Electron beam lithography

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10450, 104501U (2017) https://doi.org/10.1117/12.2280506
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Coating, Manufacturing, Contamination

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