Mr. Leander Willeke Profile

Leander Willeke

at Ruhr-Univ Bochum

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Proceedings Article | 20 June 2024 Presentation + Paper

Post treatment of plasma enhanced atomic layer deposited MoS2 via ultra short pulse laser to increase the crystallinity

Malte J. M. Becher, Leander Willeke, Claudia Bock, Andreas Ostendorf

Proceedings Volume 13005, 130050I (2024) https://doi.org/10.1117/12.3016372

KEYWORDS: Crystals, Laser processing, Raman spectroscopy, Laser crystals, Atomic layer deposition, Pulsed laser operation, Annealing, Plasma, 2D materials

Read Abstract +

2D molybdenum disulfide (MoS2) is a promising material for the application in the flexible electronic, where large, uniform, crystalline films on flexible substrates are desired. The utilization of low-temperature plasma-enhanced atomic layer deposition (PEALD) facilitates the production of large-area, uniform, polycrystalline MoS2 films on temperature-sensitive substrates. However, for next-generation electronics, the crystallite size does not fulfill requirements. In order to enhance the degree of crystallinity conventional high temperature post treatments of the whole sample, which are not compatible with flexible substrates, needs to be avoided. In this study, a method for increasing the crystallinity of polycrystalline MoS2 films on SiO₂/Si and glass substrate deposited by plasma enhanced ALD processed with femtosecond laser pulses (λ = 1030 nm, t_p = 200 fs), in a "cold" annealing process is presented. The laser fluence range varies from f_min = 3.0 mJ cm⁻² to f_max = 30.00 m J⁻² with scanning speeds from v_scan,min = 1 mm s⁻¹ to v_scan,max = 1000 mm s⁻¹, at a repetition rate of f^rep = 2000 kHz. The crystallization and the influence of the processing parameters on the film topography are analyzed in detail by Raman spectroscopy and scanning electron microscopy. Finally, the influence of the laser processing on the film resistivity is investigated.

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