Ling Ma
at Institute of Microelectronics of the CAS
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 20 December 2022
JM3, Vol. 21, Issue 04, 043204, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.043204
KEYWORDS: Source mask optimization, Extreme ultraviolet lithography, Diffraction, Nanoimprint lithography, Lithography, Genetic algorithms, Mathematical optimization, Extreme ultraviolet, Lithographic illumination, Incident light

Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Proceedings Volume 12052, 1205214 (2022) https://doi.org/10.1117/12.2622286
KEYWORDS: Photomasks, Diffraction, Nanoimprint lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithographic illumination, Lithography, Metals, Source mask optimization, Molybdenum

Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Proceedings Volume 12052, 1205218 (2022) https://doi.org/10.1117/12.2614008
KEYWORDS: Nanoimprint lithography, Extreme ultraviolet lithography, Lithography, Deep ultraviolet, Lithographic illumination, Metals, Photomasks, Extreme ultraviolet, SRAF, Image quality

Proceedings Article | 20 September 2020 Poster + Paper
Proceedings Volume 11517, 115171B (2020) https://doi.org/10.1117/12.2573145
KEYWORDS: Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Computational lithography, Source mask optimization, Deep ultraviolet, Manufacturing, Photomasks, Optimization (mathematics)

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109592X (2019) https://doi.org/10.1117/12.2514654
KEYWORDS: Overlay metrology, Finite-difference time-domain method, Diffraction, Metrology, Diffraction gratings, Reflection, Signal detection, Microelectronics

Showing 5 of 7 publications
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