Ms. Mami Miyasaka Profile

Mami Miyasaka

Assistant Manager at Renesas Electronics Corp

SPIE Involvement:

Author

Area of Expertise:

Applied physics , Optical chemistry , Lithography

Publications (4)

Proceedings Article | 23 March 2009 Paper

Implementation of the high order overlay control for mass production of 40nm node logic devices

Daisuke Umeda, Mami Miyasaka, Takayuki Uchiyama

Proceedings Volume 7272, 72720H (2009) https://doi.org/10.1117/12.813378

KEYWORDS: Overlay metrology, Semiconducting wafers, Logic devices, Error analysis, Lithography, Logic, Control systems, Optical alignment, Metrology, Front end of line

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Proceedings Article | 5 April 2007 Paper

The application of SMASH alignment system for 65-55-nm logic devices

M. Miyasaka, H. Saito, T. Tamura, T. Uchiyama, Paul Hinnen, Hyun-Woo Lee, Marc van Kemenade, Mir Shahrjerdy, Robert van Leeuwen

Proceedings Volume 6518, 65180H (2007) https://doi.org/10.1117/12.711059

KEYWORDS: Optical alignment, Diffraction, Overlay metrology, Sensors, Signal processing, Semiconducting wafers, Optical design, Signal detection, Diffraction gratings, Manufacturing

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Proceedings Article | 20 August 2001 Paper

Development of data conversion system for electron-beam projection lithography (EPL) mask

Yasuhisa Yamada, Hideo Kobinata, Takao Tamura, Mami Miyasaka, Tatsuya Sakamoto, Yuzo Ogawa, Kenichi Takada, Hiroshi Yamashita, Hiroshi Nozue

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436678

KEYWORDS: Data conversion, Photomasks, Electron beams, Projection lithography, Electron beam lithography, Lithography, Semiconducting wafers, Astatine, Genetic algorithms, Wafer-level optics

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Proceedings Article | 21 July 2000 Paper

Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography (EPL)

Mami Miyasaka, Kenichi Tokunaga, Fumihiro Koba, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390070

KEYWORDS: Quantum efficiency, Projection lithography, Lithography, Electron beam direct write lithography, Electron beam lithography, Electron beams, Photomasks, Scanning electron microscopy, Molecules, Chemical analysis

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