A gold nanoparticle enhanced microwave modulation with 1.55 μm light in graphene-based antenna has been studied in this paper. The modulation of antenna radiation is achieved by the conductivity tunable characteristic of graphene, and the conductivity of graphene is controlled by light. With the introduction of the gold nanoparticles for exciting optical wave localized enhancement, the interaction between the graphene and the light is enhanced. And then the Fermi level is enlarged, leading to the enhancement of the conductivity turning rage of graphene. At last, the modulation of microwave radiation is enhanced. In the simulation, as the Fermi level of graphene increases from 0.1 eV to 0.4 eV, the S11 coefficient of resonant point of antenna changes by 8 dB. In the experiment, the 0-29.4 mw 1550 nm light is used, the S11 coefficient of graphene antenna with gold nanoparticles changes by 1 dB, which is 2 times higher than that of graphene antenna without gold nanoparticles. The result demonstrates that the microwave modulation by light in graphene-based antenna could be enhanced by gold nanostructures with the localized surface plasmons.
Nano-conglutination technology is a nonconventional nanofabrication technique to use adhesive materials to “stick” nanostructures, which relies on excellent properties of adhesive materials. In this article, we propose a novel hybrid material based on thiol-ene system as the adhesive material for nano-conglutination technology. Thiol-ene system is a kind of UV-curable polymer via “click reaction” to form cross-linked network, which is low viscosity, rapid polymerization rate, high Young’s modulus, and low cost. High-resolution nanostructures such as nano-bowl and nanopillar arrays with sub-200 nm resolution are achieved using thiol-ene adhesive material via nano-conglutination technology. Special reactions of thiols with reactive carbon-carbon double bonds happen in the crosslink process, which make the thiol-ene system be enough low viscosity to keep conformal with the stuck nanostructures and be enough high rigid to easily separate from the mold and keep the original arrangement of nanostructures. This study promotes nanostructures for potential applications of optical, electronics, and photonic devices due to the surface plasmon resonance, surface enhanced Raman spectroscopy, electrical effect, and nonlinear optical response.
The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated.
According to the exposure pattern distortion in contact printing caused by the photoresist and sometimes has a rough surface with impurity particles on it, we propose a new flexible hybrid mask for contact printing. The mask consists of three layers: a flexible polymer buffer layer, a polymer structure layer of high Young's modulus, and a metal masking layer. Because the hybrid mask skillfully combines the characteristics of flexible polymer and high Young's modulus polymer, it has two advantages: high flexibility and high resolution. The flexible hybrid mask can attach closely with the photoresist under the condition of vacuum adsorption. So the fabrication of micro-nano structures with high precision and high resolution can be realized. In this paper, a new flexible hybrid mask with critical dimension of 2um was fabricated. The photoresist structure with high precision was manufactured using this mask by photolithography and it verified the feasibility of the mask for lithography.
With the advantages of small structure and high efficiency, the diffractive element is widely used in the construction of a structured light 3D measurement system. But the working wavelength of diffraction element is single, and the light field generated by the diffraction element is only one channel. We make the original single channel into three channels, so as to achieve from the serial algorithm to parallel algorithm to improve the measurement speed. Based on the lattice light field and the design method of multi wavelength diffraction elements, and in the premise of ensuring the number of points, the traditional lattice points of light field are divided into three channels. These channels are regarded as the target fields, and the diffraction element for generating color structure light field is designed.
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