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Mark O. Mahoney
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Publications (1)
Proceedings Article | 24 March 2016 Paper
Focus control enhancement and on-product focus response analysis methodology
Young Ki Kim, Yen-Jen Chen, Xueli Hao, Pavan Samudrala, Juan-Manuel Gomez, Mark Mahoney, Ferhad Kamalizadeh, Justin Hanson, Shawn Lee, Ye Tian
Proceedings Volume 9778, 97780T (2016) https://doi.org/10.1117/12.2213019
KEYWORDS: Error analysis, High volume manufacturing, Semiconducting wafers, Metrology, Process control, Control systems, Scanners, Diffraction, Time metrology, Forward error correction, Lithography, Critical dimension metrology
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