Dr. Minjung Kim
at NVIDIA
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124951D (2023) https://doi.org/10.1117/12.2661138
KEYWORDS: Extreme ultraviolet lithography, Photoresist technology, Line edge roughness, Critical dimension metrology, Critical dimension scanning electron microscopy, Image processing, Signal to noise ratio, Denoising, Scanning electron microscopy, Metrology, Line width roughness, Artificial intelligence, Machine learning

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