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Naoki Nishioka
at Osaka Institute of Technology
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Publications (1)
Proceedings Article | 12 October 2021 Poster + Presentation
High-speed imaging of photoresist stripping phenomena induced by laser irradiation without causing the laser damage
Yuki Matsumoto, Naoki Nishioka, Atsushi Koizumi, Akito Uemura, Ryosuke Nakamura, Masashi Yoshimura, Hideo Horibe, Tomosumi Kamimura
Proceedings Volume 11910, 119101C (2021) https://doi.org/10.1117/12.2598555
KEYWORDS: Laser irradiation, Laser induced damage, Photoresist materials, High speed imaging, Pulsed laser operation, Silicon, Semiconducting wafers, Photoresist processing, Laser imaging, Semiconductors
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