Ms. Olha Sysova Profile

Olha Sysova

at CNRS UMR7361 IS2M

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Publications (1)

Proceedings Article | 1 May 2023 Presentation + Paper

Chitosan as a water-based photoresist for DUV lithography

Isabelle Servin, Alexandre Teolis, Arnaud Bazin, Aurélien Sarrazin, Paule Durin, Olha Sysova, Corinne Gablin, Benoît Saudet, Didier Leonard, Olivier Soppera, Jean-Louis Leclercq, Yann Chevolot, Raluca Tiron, Thierry Delair, Stephane Trombotto

Proceedings Volume 12498, 1249818 (2023) https://doi.org/10.1117/12.2658423

KEYWORDS: Semiconducting wafers, Silicon, Deep ultraviolet, Lithography, Photoacid generators, Photoresist processing, Plasma etching, Etching, Optical lithography, Film thickness, Sustainability

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