Diffracting crystals are extensively used at synchrotron beamlines as x-ray monochromators and phase retarders. Imperfect growth processes, surface damage occurring during fabrication, and strain caused by poor clamping methods can all degrade the quality of these crystals and the x-ray beams diffracted by them. Because x-ray topography of these crystals can reveal both the location and the magnitude of these defects, it is now regularly used as an acceptance test for diffracting crystal optics at the Diamond Light Source synchrotron. Before installation on beamlines, crystal optics are inspected at the versatile bending-magnet B16 Test Beamline, where a variety of topographic techniques have been implemented with both white and monochromatic x-ray beams. A set of digital detectors permits rocking curve imaging with a choice of fields of view and spatial resolution down to 2 μm. Test crystals may be mounted in a variety of geometries according to need. For inspecting monochromator crystals fabricated for imaging applications, both on-the-fly scans and stitching techniques have been used to compose maps of surface defects. First crystals of multi-crystal monochromators have been tested under realistic cryocooled conditions, and their design has been improved to minimize strain. The Diamond Light Source’s x-ray topography program serves not only its own beamlines, but also industrial users and other x-ray synchrotron facilities.
Brilliant beams of hard x-rays, with geometrical cross-sections below 50×50 nm2, are a standard research tool for
synchrotron users. With the advent of lower emittance sources, such as NSLSII, Petra III and Max IV, and planned
upgraded lattices, such as APS-2, SPING8-II, ESRF II and DLS II, nanofocusing optics operating in transmission mode
will become more competitive than they are currently. In general, they suffer from lower efficiency than reflective
optics, however they often have easier set-up and alignment, combined with a smaller footprint. Fabrication and
exploitation of ultra-short focal refractive lenses has not witnessed the same progress in the last decade as other optics,
such as multilayer mirrors and multilayer Laue lenses. This paper reports on current status of high-resolution lithography
for fabricating silicon lenses and on proposed designs for a new class of refractive lenses with zero aberrations and good
efficiency. The new designs are created with geometrical parameters matching the spatial resolution achieved by modern
lithography and silicon etch technology.
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