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Sangah Lee
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Publications (3)
Proceedings Article | 23 March 2020 Presentation + Paper
Process related yield risk mitigation with in-design pattern replacement for system ICs manufactured at advanced technology nodes
Proceedings Volume 11328, 113280I (2020) https://doi.org/10.1117/12.2551970
KEYWORDS: Metals, Design for manufacturing, Chemical mechanical planarization, Silicon, Reliability, Optical proximity correction, Semiconducting wafers, Extreme ultraviolet lithography, Manufacturing, Yield improvement
Proceedings Article | 4 April 2019 Presentation + Paper
A novel design-for-yield solution based on interconnect level layout improvements at 7nm technology node
Proceedings Volume 10962, 1096204 (2019) https://doi.org/10.1117/12.2514896
KEYWORDS: Computer aided design, Metals, Resolution enhancement technologies, Optical lithography, CMOS technology, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Double patterning technology, Manufacturing
Proceedings Article | 20 March 2019 Paper
Machine learning to improve accuracy of fast lithographic hotspot detection
Proceedings Volume 10962, 1096216 (2019) https://doi.org/10.1117/12.2515139
KEYWORDS: Machine learning, Data modeling, Lithography, Neural networks, Manufacturing, Computer simulations, Design for manufacturability, Design for manufacturing, Feature extraction, Electronics
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