Satoru Nemoto
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 14 October 2011 Paper
Tom Faure, Satoshi Akutagawa, Karen Badger, Louis Kindt, Jun Kotani, Takashi Mizoguchi, Satoru Nemoto, Kazunori Seki, Tasuku Senna, Richard Wistrom, Shinich Igarashi, Yukio Inazuki, Kazuhiro Nishikawa, Hiroki Yoshikawa
Proceedings Volume 8166, 816617 (2011) https://doi.org/10.1117/12.898889
KEYWORDS: Photomasks, SRAF, Opacity, Inspection, Chromium, Etching, Optical proximity correction, Photoresist processing, Resistance, Lithography

Proceedings Article | 25 September 2010 Paper
Tom Faure, Karen Badger, Louis Kindt, Yutaka Kodera, Toru Komizo, Shinpei Kondo, Takashi Mizoguchi, Satoru Nemoto, Kazunori Seki, Tasuku Senna, Richard Wistrom, Amy Zweber, Kazuhiro Nishikawa, Yukio Inazuki, Hiroki Yoshikawa
Proceedings Volume 7823, 78230J (2010) https://doi.org/10.1117/12.864130
KEYWORDS: Photomasks, Etching, Binary data, Opacity, Inspection, Image processing, Photoresist processing, Dry etching, Mask making, Thin films

Proceedings Article | 23 September 2009 Paper
A. Zweber, T. Komizo, J. Levin, J. Whang, S. Nemoto, S. Kondo
Proceedings Volume 7488, 74880J (2009) https://doi.org/10.1117/12.830123
KEYWORDS: Line edge roughness, Temperature metrology, Photomasks, Etching, Diffusion, Scatterometry, Glasses, Photoresist processing, Scanning electron microscopy, Scatter measurement

Proceedings Article | 11 May 2009 Paper
Satoru Nemoto, Thomas Faure, Richard Wistrom, Shaun Crawford, Gary Reid, Peter Bartlau, Toru Komizo, Amy Zweber
Proceedings Volume 7379, 737907 (2009) https://doi.org/10.1117/12.824248
KEYWORDS: Etching, Photomasks, Opacity, Critical dimension metrology, Dry etching, Binary data, Photoresist processing, Mask making, Standards development, Quartz

Proceedings Article | 17 October 2008 Paper
Richard Wistrom, Toru Komizo, Satoru Nemoto, A. Gary Reid
Proceedings Volume 7122, 71220F (2008) https://doi.org/10.1117/12.801570
KEYWORDS: Etching, Chromium, Photomasks, Plasma etching, Quartz, Phase shift keying, Phase shifts, Plasma, Photoresist materials, Critical dimension metrology

Showing 5 of 10 publications
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