Scissionable polymers are polymers that will depolymerize under different stimuli including acid, base, and free radicals. These polymers have been investigated in the development of photoresists and other degradable materials. This work focuses on the poly(phthalaldehyde), PPA, a family of scissionable polymers. The PPA backbone consists of acetal linkages that are very sensitive to acids. Upon exposure to acids, the polymer chain depolymerizes to its corresponding monomers. This depolymerization behavior makes PPAs excellent candidates as photoresist materials. Several new PPA photoresists are being explored in this work.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.