Dr. Walter D. Mieher Profile

Dr. Walter D. Mieher

at KLA Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 8 November 2012 Paper

Reflective electron-beam lithography performance for the 10nm logic node

Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis

Proceedings Volume 8522, 85221J (2012) https://doi.org/10.1117/12.964978

KEYWORDS: Electron beam lithography, Lithography, Semiconducting wafers, Reflectivity, Logic, YAG lasers, Direct write lithography, Wafer-level optics, Computer aided design, Electron beams

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Proceedings Article | 21 March 2012 Paper

Reflective electron-beam lithography: progress toward high-throughput production capability

Regina Freed, Thomas Gubiotti, Jeff Sun, Francoise Kidwingira, Jason Yang, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis, Shy-Jay Lin, Wen-Chuan Wang

Proceedings Volume 8323, 83230H (2012) https://doi.org/10.1117/12.916090

KEYWORDS: Electron beam lithography, Semiconducting wafers, Electroluminescence, Lithography, Monte Carlo methods, Reflectivity, Electron beams, Direct write lithography, Silicon, Computer aided design

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Proceedings Article | 24 March 2008 Paper

Opportunities and challenges for optical CD metrology in double patterning process control

Daniel Wack, John Hench, Leonid Poslavsky, John Fielden, Vera Zhuang, Walter Mieher, Ted Dziura

Proceedings Volume 6922, 69221N (2008) https://doi.org/10.1117/12.772997

KEYWORDS: Metrology, Process control, Etching, Critical dimension metrology, Systems modeling, Spectroscopy, Double patterning technology, Optical lithography, Performance modeling, Reflectometry

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Proceedings Article | 24 March 2006 Paper

Scatterometry measurements of line end shortening structures for focus-exposure monitoring

Kelvin Hung, Yung Feng Cheng, Jie Wei Sun, Benjamin Szu-Min Lin, Steven Fu, Thaddeus Dziura, Marcelo Cusacovich, Walter Mieher

Proceedings Volume 6152, 61521W (2006) https://doi.org/10.1117/12.655746

KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Data modeling, Scatterometry, Finite element methods, Lithography, Metrology, Process control, Photoresist processing, Scatter measurement

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Proceedings Article | 16 July 2002 Paper

Spectroscopic CD metrology for sub-100-nm lithography process control

Walter Mieher, Thaddeus Dziura, Xuemei Chen, Paola DeCecco, Ady Levy

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473424

KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Photoresist processing, Lithography, Critical dimension metrology, Process control, Metrology, Spectroscopy, Wafer testing, Reticles

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Proceedings Article | 25 September 1995 Paper

Femtosecond laser activation of surface reactions

Richard Finlay, Shrenik Deliwala, Jay Goldman, Tsing-Hua Her, Walter Mieher, C. Wu, Eric Mazur

Proceedings Volume 2547, (1995) https://doi.org/10.1117/12.221499

KEYWORDS: Picosecond phenomena, Electrons, Carbon dioxide, Carbon dioxide lasers, Pulsed laser operation, Platinum, Femtosecond phenomena, Spectroscopy, Carbon monoxide, Gas lasers

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Showing 5 of 6 publications

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