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Yanbo Liu
at Shanghai Nanotechnology Promotion Ctr
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Publications (1)
Proceedings Article | 20 March 2009 Paper
Array with phase change material Si2Sb2Te5 fabricated by UV-imprint lithography
Yanbo Liu, Xiaoming Niu, Zhitang Song, Guoquan Min, Weimin Zhou, Jing Zhang, Ting Zhang, Bo Liu, YongZhong Wan, Xiaoli Li, Jianping Zhang, Songlin Feng
Proceedings Volume 7125, 71251X (2009) https://doi.org/10.1117/12.820901
KEYWORDS: Resistance, Lithography, Crystals, X-ray diffraction, Data storage, Silica, Tin, Silicon, Nanolithography, Nanotechnology
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