Dr. Yasuhiko Nakayama Profile

Dr. Yasuhiko Nakayama

at Kankyo Semiconductors Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 12 May 2006 Paper

Characterization of β-FeSi₂ films as a novel solar cell semiconductor

Yasuhiro Fukuzawa, Teruhisa Ootsuka, Naotaka Otogawa, Hironori Abe, Yasuhiko Nakayama, Yunosuke Makita

Proceedings Volume 6197, 61970N (2006) https://doi.org/10.1117/12.663892

KEYWORDS: Silicon, Iron, Gallium, Fourier transforms, Annealing, Chemical species, Solar cells, Diffusion, Doping, Interfaces

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Proceedings Article | 12 May 2006 Paper

Growth of beta-iron disilicide (β-FeSi₂) on flexible metal sheet substrates for solar-cell application

Yasuhiko Nakayama, Zhengxin Liu, Masato Osamura, Teruhisa Ootsuka, Yasuhiro Fukuzawa, Naotaka Otogawa, Hironori Abe, Yunosuke Makita

Proceedings Volume 6197, 619718 (2006) https://doi.org/10.1117/12.663986

KEYWORDS: Iron, Silicon, Thin films, Metals, Solar cells, Temperature metrology, Raman scattering, Chemical species, Molybdenum, Tantalum

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Proceedings Article | 12 May 2006 Paper

β-FeSi₂ as a Kankyo (environmentally friendly) semiconductor for solar cells in the space application

Yunosuke Makita, Teruhisa Ootsuka, Yasuhiro Fukuzawa, Naotaka Otogawa, Hironori Abe, Zhengxin Liu, Yasuhiko Nakayama

Proceedings Volume 6197, 61970O (2006) https://doi.org/10.1117/12.664009

KEYWORDS: Silicon, Iron, Solar cells, Semiconductors, Fourier transforms, Thin films, Interfaces, Chemical species, Electrodes, Resistance

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Proceedings Article | 14 April 2003 Paper

Prototype infrared optical sensor and solar cell made of B-FeSi2 thin film

Shinan Wang, Naotaka Otogawa, Yasuhiko Fukuzawa, Honglie Shen, Hisao Tanoue, Takeshi Kojima, Yasuhiko Nakayama, Yunosuke Makita

Proceedings Volume 5065, (2003) https://doi.org/10.1117/12.502278

KEYWORDS: Silicon, Thin films, Solar cells, Electrodes, Optical sensors, Diodes, Iron, Prototyping, Resistance, Infrared radiation

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Proceedings Article | 17 May 1994 Paper

Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography

Masahiro Watanabe, Yoshitada Oshida, Yasuhiko Nakayama, Minoru Yoshida, Ryuichi Funatsu, Akira Fujii, Taku Ninomiya

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175490

KEYWORDS: Semiconducting wafers, Photoresist materials, Wafer-level optics, Control systems, Aluminum, Lithography, Modulation, Interferometry, Optical lithography, Beam splitters

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