We have developed a high-resolution x-ray microscope with spatial resolution better than 100 nm. The utilized x-ray energy of the microscope is 17.5 keV that can penetrate through standard silicon substrate and enables to observe embedded nanoscale metal structure and defects, nondestructively. We have applied the present x-ray microscope for investigating 3D flash memory devices and observed precise metal filling structure in there. In addition, defects in the circuit area were also found.
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