CONFERENCE PROCEEDINGS
Advanced Search
Yoshiaki Matsura
at Osaka Institute of Technology
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 4 December 2012 Paper
Laser removal of positive-tone diazonaphthoquinone / novolak resist without occurring laser-induced damage to the silicon wafer
Hiroki Muraoka, Tomosumi Kamimura, Yuki Yamana, Yoshiaki Matsura, Hideo Horibe
Proceedings Volume 8530, 85301V (2012) https://doi.org/10.1117/12.977338
KEYWORDS: Silicon, Semiconducting wafers, Laser irradiation, Laser damage threshold, Laser induced damage, Near infrared, Visible radiation, Laser energy, Semiconductor lasers, Nd:YAG lasers
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top