Ms. Young A. H. Kwon Profile

Young A. H. Kwon

Research Scientist at KIST

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Proceedings Article | 15 October 2001 Paper

Fabrication of a micromold using negative PMER

Young Kwon, Kyoung-Soo Chae, Dae Jeoung, Jong Kim, Sung Moon

Proceedings Volume 4601, (2001) https://doi.org/10.1117/12.444743

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We fabricated a micro mold using UV-lithography process with a novel mold material, negative PMER. Negative PMER(TOK, PMER N-CA3000) is a chemically amplified negative tone photoresist on a novolak resin base. It can be processed using standard equipment such as standard spin coater, baking with ovens or hotplates, and immersion development tools. Good quality resist patterns of up to 36μm thickness were achieved by means of this equipment in a short time. The conditions of this process were pre-exposure bake of 110 degree(s)C/12min, exposure dose of 675mJ/cm² post-exposure bake of 100 degree(s)C/9min, and development for 10min.

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