Mr. Youngtae Kim Profile

Youngtae Kim

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 25 May 2022 Presentation + Paper

Perfluoroalkylated metallophthalocyanines as EUV resist candidates

Yejin Ku, Jun-il Kim, Hyun-Taek Oh, Youngtae Kim, Minkyu Choi, Jin-Kyun Lee, Kang-Hyun Kim, Byeong-Gyu Park, Sangsul Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim

Proceedings Volume 12055, 120550D (2022) https://doi.org/10.1117/12.2612313

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Electron beam lithography, Zinc, Lithography, Thin films, Metals

Read Abstract +

In this study, a molecular resist capable of high-resolution patterning with excellent sensitivity was pursued by introducing a metal atom into a small molecular fluorinated core. After selecting the phthalocyanine (Pc) unit as a molecular framework, exhibiting excellent chemical stability and etch resistance, fluorinated alkyl and aryl moieties and zinc atoms were incorporated into the framework to complete the synthesis of Pc-based EUV resists. Analyses of the recovered compounds were performed by nuclear magnetic resonance (NMR), Fourier transform infrared spectroscopy (FT IR), and ultraviolet–visible (UV-vis) spectroscopy to confirm that the structures of the desired materials were secured properly. Through the electron-beam lithographic experiments, it was verified that all the thin films composed of the three Pc materials lost their solubility by interacting with high-energy electrons to form negative-tone images. When EUV lithography was carried out on ZnPc-A, which has linear perfluoroalkyl moieties, 40 nm-sized patterns were formed at the relatively small energy of 34 mJ/cm². From the synthesis and lithographic characterization results, it can be assumed that fluorinated metallophthalocyanine materials can be considered EUV resist candidates. However, for highresolution patterning, it is necessary to maintain an appropriate film thickness and adjust the processing parameters, including the adhesion to the substrate.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years