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Masaki Mitsuyasu
at Institute of Scientific and Industrial Research
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Publications (1)
Proceedings Article | 19 March 2015 Paper
Effects of low-molecular weight resist components on dissolution behavior of chemically amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance
Proceedings Volume 9422, 94222D (2015) https://doi.org/10.1117/12.2085482
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Quartz, Crystals, Photoresist processing, Lithography, Chemically amplified resists, Thin films, Silicon
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