Sapphire crystal as a kind of good material has a good transmittance in the ultraviolet, visible, infrared, which was widely used in the high-intensity laser system as the window material. Anti-reflection thin films on sapphire substrate were commonly used in high-energy laser system in the middle infrared bands 3~5μm and these thin films are very easily damaged for high energy laser system. In this paper, we adopt thermal evaporation technique on the sapphire substrate was prepared by design of single layer and multilayer anti-reflection coatings system so that the infrared transmittance satisfy the design requirements. The results of transmittance and laser damage performance tests show that the anti-reflection coating of 3~5μm transmittance is more than 97% on average, Laser-induced damage threshold (LIDT) is more than 5J/cm2 (1064nm), which means that this method could obtain a high-quality laser film.
The optical thin film parts are important components used in the laser systems. In practice, the electromagnetic field generated by the laser will make complex and diverse changes on the films, but the fundamental related with properties changing is not clear. For the purpose of recognizing the variation of TiO2 films irradiated by the laser, TiO2 films were prepared on K9 substrates at the same experimental conditions with the exception that the irradiating laser energy was different to investigate effects about the film’s properties and morphology between the before and after irradiation. The following film’s factors: transmittance, refractive index, extinction coefficient, film thickness and laser-induced damage threshold (LIDT) are included in experimental results, also, morphology and roughness by an Atomic Force Microscope (AFM) and a Taylor Surf CCI 2000 non-contact instrument are needed. The result showed that irradiating laser can decrease TiO2 films’ transmittance and roughness, and increases the films’ refractive index and LIDT. Furthermore, the results indicated that different laser energy cause the different morphology of films.
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