Update on main chain scission resists in Zeon for high-NA EUV lithography

Akihide Shirotori; Yuji Oda; Kazunori Taguchi; Sin Fu Yeh; Hyo Seon Suh; Danilo De Simone; Geert Vandenberghe; Hideaki Sanuki

doi:10.1117/12.2686602

21 November 2023 Update on main chain scission resists in Zeon for high-NA EUV lithography

Akihide Shirotori, Yuji Oda, Kazunori Taguchi, Sin Fu Yeh, Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Author Affiliations +

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500U (2023) https://doi.org/10.1117/12.2686602
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

In this work, we introduce main chain scission resists with new concept for High-NA’s generation and report their lithography performance. Zeon has developed a new resist (ZR12A, R&D sample) in order to improve both resolution and lithography performance because conventional Zeon resists generated worse resolution and kissing(C/H), pinching(L/S) defects at tight pitch by top loss. The concreate approaches in order to improve the challenges are that to make scission reaction efficient and to get developability at exposed area higher in changing both monomers and functional groups. Zeon aims to make clear threshold between exposed and un-exposed area and improve low contrast and sensitivity at tight patterns especially. The lithography performance of ZR12A with their approaches were able to improve LCDU and margin with low LCDU on litho-performance compared to ZER02#04DM. Additionally, ZR12A has good etching resistance and can improve LCDU in AEI as well at this paper.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Akihide Shirotori, Yuji Oda, Kazunori Taguchi, Sin Fu Yeh, Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, and Hideaki Sanuki "Update on main chain scission resists in Zeon for high-NA EUV lithography", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500U (21 November 2023); https://doi.org/10.1117/12.2686602

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