A holistic metrology approach: multi-channel scatterometry for complex applications

Cornel Bozdog; Hyang Kyun Kim; Susan Emans; Boris Sherman; Igor Turovets; Ronen Urensky; Boaz Brill; Alok Vaid; Matthew Sendelbach

doi:10.1117/12.881638

20 April 2011 A holistic metrology approach: multi-channel scatterometry for complex applications

Cornel Bozdog, Hyang Kyun Kim, Susan Emans, Boris Sherman, Igor Turovets, Ronen Urensky, Boaz Brill, Alok Vaid, Matthew Sendelbach

Author Affiliations +

Proceedings Volume 7971, Metrology, Inspection, and Process Control for Microlithography XXV; 797113 (2011) https://doi.org/10.1117/12.881638
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Improvement in metrology performance when using a combination of multiple optical channels vs. standard single optical channel is studied. Two standard applications (gate etch 4x and STI etch 2x) are investigated theoretically and experimentally. The results show that while individual channels might have increased performance for few individual parameters each - it is the combination of channels that provides the best overall performance for all parameters.

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Cornel Bozdog, Hyang Kyun Kim, Susan Emans, Boris Sherman, Igor Turovets, Ronen Urensky, Boaz Brill, Alok Vaid, and Matthew Sendelbach "A holistic metrology approach: multi-channel scatterometry for complex applications", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 797113 (20 April 2011); https://doi.org/10.1117/12.881638

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