Publication guidelines for semiconductor plasma-etch technology

Harry J. Levinson

doi:10.1117/1.JMM.20.4.040103

22 November 2021 Publication guidelines for semiconductor plasma-etch technology

Harry J. Levinson

Author Affiliations +

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 20, Issue 4, 040103 (November 2021). https://doi.org/10.1117/1.JMM.20.4.040103

Abstract

Editor-in-Chief Harry Levinson outlines new guidelines for semiconductor plasma-etch technology.

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Harry J. Levinson "Publication guidelines for semiconductor plasma-etch technology," Journal of Micro/Nanopatterning, Materials, and Metrology 20(4), 040103 (22 November 2021). https://doi.org/10.1117/1.JMM.20.4.040103

Published: 22 November 2021

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KEYWORDS

Etching

Plasma

Semiconductors

Semiconducting wafers

Optical lithography

Metrology

Plasma physics

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