Dr. Harry J. Levinson
Principal Lithographer at HJL Lithography
SPIE Involvement:
Awards Committee | Conference Program Committee | Editor-in-Chief: Journal of Micro/Nanopatterning, Materials, and Metrology | Editor-in-Chief: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author | Instructor
Area of Expertise:
Lithography
Publications (120)

SPIE Journal Paper | 23 November 2024 Open Access
JM3, Vol. 23, Issue 04, 040101, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.040101

SPIE Journal Paper | 29 October 2024 Open Access
JM3, Vol. 24, Issue 01, 011005, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011005
KEYWORDS: Extreme ultraviolet lithography, Photons, Extreme ultraviolet, Optical lithography, Electrons, Gas lasers, Free electron lasers, Light absorption, Light sources, Phase shifts

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 1327318 (2024) https://doi.org/10.1117/12.3029169
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Electrons, Free electron lasers, Phase shifts, Light sources, Molecules

SPIE Journal Paper | 18 September 2024 Open Access
JM3, Vol. 23, Issue 03, 030101, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.3.030101
KEYWORDS: Lithography, Photomask technology, Photomasks, Extreme ultraviolet lithography, Silicon, Optical lithography

SPIE Journal Paper | 11 June 2024 Open Access
JM3, Vol. 23, Issue 02, 020101, (June 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.2.020101
KEYWORDS: Photomasks, Lithography, Sustainability, Extreme ultraviolet, Energy efficiency, X-ray lithography, Wafer level optics, Solid state lasers, Simulations, Semiconductors

SPIE Journal Paper | 3 April 2024 Open Access Video Abstract Content
JM3, Vol. 23, Issue 02, 020701, (April 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.2.020701
KEYWORDS: Optical lithography, Printing

SPIE Journal Paper | 12 March 2024 Open Access
JM3, Vol. 23, Issue 01, 010101, (March 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.010101
KEYWORDS: Lithography, Semiconductors, Optical lithography, Vacuum, Engineering, Physics, Plasma etching, Photomasks, Photomask technology, Photoemission spectroscopy

SPIE Journal Paper | 20 October 2023 Open Access
JM3, Vol. 22, Issue 04, 040101, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.040101
KEYWORDS: Lithography, Printing, Photomasks, Photomask technology, Mask making, Extreme ultraviolet lithography, Reticles, Optical lithography, Manufacturing, Integrated circuits

Proceedings Article | 11 October 2023 Paper
Proceedings Volume 12807, 128070D (2023) https://doi.org/10.1117/12.3011327

SPIE Journal Paper | 13 September 2023 Open Access
JM3, Vol. 22, Issue 03, 030101, (September 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.030101
KEYWORDS: Industry, Glasses, Lithography, Electrons, Beryllium, Semiconductors, Optical lithography, Universities, Chemistry, Chemical reactions

SPIE Journal Paper | 5 June 2023 Open Access
JM3, Vol. 22, Issue 02, 020101, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.020101
KEYWORDS: Lithography, Metrology, Extreme ultraviolet lithography, 3D mask effects, Optical lithography, Overlay metrology, Manufacturing, Feature extraction, Extreme ultraviolet, Design rules

SPIE Journal Paper | 21 March 2023 Open Access
JM3, Vol. 22, Issue 01, 010101, (March 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.1.010101
KEYWORDS: Peer review, Industry, Engineering, Artificial intelligence, Software development, Reflection

SPIE Journal Paper | 29 November 2022 Open Access
JM3, Vol. 21, Issue 04, 040101, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.040101
KEYWORDS: Video, Video processing, Graphite oxide, Extreme ultraviolet lithography, Quality control, Process modeling, Modeling, Mathematics, Lithography, Digital video recorders

SPIE Journal Paper | 9 August 2022 Open Access
JM3, Vol. 21, Issue 03, 030101, (August 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.3.030101
KEYWORDS: Lead, Software engineering, Semiconductors, Nanostructures, Microopto electromechanical systems, Microelectromechanical systems, Metrology, Information technology, Image processing

SPIE Journal Paper | 26 May 2022 Open Access
JM3, Vol. 21, Issue 02, 020101, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.020101
KEYWORDS: Optical lithography, Lithography, Silicon, Photomasks

SPIE Journal Paper | 20 January 2022 Open Access
JM3, Vol. 21, Issue 01, 010101, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.010101
KEYWORDS: Metrology, Photomasks, Optical lithography, Lithography, Extreme ultraviolet, Semiconductors, Nanotechnology, Microopto electromechanical systems, Microelectromechanical systems, Integrated photonics

SPIE Journal Paper | 22 November 2021 Open Access
JM3, Vol. 20, Issue 04, 040103, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.040103
KEYWORDS: Etching, Plasma, Semiconductors, Semiconducting wafers, Optical lithography, Stochastic processes, Plasma physics, Metrology, Wet etching, Photoresist materials

SPIE Journal Paper | 1 October 2021 Open Access
JM3, Vol. 20, Issue 04, 040102, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.040102
KEYWORDS: Computational lithography, Finite-difference time-domain method, Computer simulations, Photomasks, Lithography, Semiconducting wafers, Physics, New and emerging technologies, Neural networks, Network architectures

SPIE Journal Paper | 24 September 2021 Open Access
JM3, Vol. 20, Issue 04, 040101, (September 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.040101
KEYWORDS: Web 2.0 technologies, Lithography

SPIE Journal Paper | 23 July 2021 Open Access
JM3, Vol. 20, Issue 03, 030101, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.030101
KEYWORDS: Semiconducting wafers, Optical lithography, Electron beam lithography, Overlay metrology, Optical alignment, Nanoimprint lithography, Lithography, Polarization, Pellicles, Optics manufacturing

SPIE Journal Paper | 13 April 2021 Open Access
JM3, Vol. 20, Issue 02, 020101, (April 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.020101
KEYWORDS: Metrology, Photomasks, Scanning electron microscopy, Overlay metrology, Etching, Inspection, Data modeling, Calibration, Thin film coatings, Semiconducting wafers

SPIE Journal Paper | 19 January 2021 Open Access
JM3, Vol. 20, Issue 01, 010102, (January 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.010102
KEYWORDS: Lithography, Semiconducting wafers, Photomasks, Overlay metrology, Semiconductors, Metrology, Astatine

SPIE Journal Paper | 15 January 2021 Open Access
JM3, Vol. 20, Issue 01, 010101, (January 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.010101
KEYWORDS: Optical lithography, Semiconductors, Lithography, Standards development, Metrology, Manufacturing, Electronics, Computational lithography, Reactive ion etching, Photomasks

SPIE Press Book | 26 October 2020
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Semiconducting wafers, Lithography, Pellicles, Mirrors, Optical lithography, Reflectivity, EUV optics

SPIE Journal Paper | 20 October 2020 Open Access
JM3, Vol. 19, Issue 04, 040101, (October 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.4.040101

SPIE Journal Paper | 4 August 2020 Open Access
JM3, Vol. 19, Issue 03, 030101, (August 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.030101
KEYWORDS: Lithography, Silicon films, Silicon, Polymers, Photoresist processing, Microopto electromechanical systems, Microelectromechanical systems, Metrology, Data processing

SPIE Journal Paper | 19 May 2020 Open Access
JM3, Vol. 19, Issue 02, 020101, (May 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.2.020101
KEYWORDS: Metrology, Lithography, Microopto electromechanical systems, Electronic components, Optical microsystems, Optical lithography, Process control, Etching, Microsystems, Optical engineering

Proceedings Article | 28 April 2020 Open Access Presentation
Proceedings Volume 11323, 113232P (2020) https://doi.org/10.1117/12.2572272

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113231N (2020) https://doi.org/10.1117/12.2551311
KEYWORDS: Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Logic, Lithography, Line edge roughness, Nanoimprint lithography, Absorbance, Line width roughness

Proceedings Article | 29 August 2019 Open Access Paper
Proceedings Volume 11177, 1117702 (2019) https://doi.org/10.1117/12.2528446
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Photomasks, Line edge roughness, Extreme ultraviolet, Process control, Lithography, Stochastic processes, Double patterning technology, Chemically amplified resists

SPIE Press Book | 24 May 2019
KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Reticles, Optical lithography, Optical alignment, Extreme ultraviolet lithography, Photoresist materials, Lenses, Extreme ultraviolet

Proceedings Article | 24 October 2018 Open Access Presentation + Paper
Proceedings Volume 10809, 1080903 (2018) https://doi.org/10.1117/12.2502791
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Chemically amplified resists, Optical lithography, Pellicles, Line edge roughness, Reliability, Contamination

SPIE Journal Paper | 24 September 2018
Allen Gabor, Andrew Brendler, Timothy Brunner, Xuemei Chen, James Culp, Harry Levinson
JM3, Vol. 17, Issue 04, 041008, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041008
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

Proceedings Article | 30 March 2018 Presentation + Paper
Allen Gabor, Andrew Brendler, Timothy Brunner, Xuemei Chen, James Culp, Harry Levinson
Proceedings Volume 10583, 105830C (2018) https://doi.org/10.1117/12.2297459
KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Line edge roughness, Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105831N (2018) https://doi.org/10.1117/12.2297492
KEYWORDS: Line edge roughness, Stochastic processes, Calibration, Edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Metals, Photoresist materials, Absorption, Monte Carlo methods

Proceedings Article | 30 August 2017 Paper
Proceedings Volume 10320, 1032002 (2017) https://doi.org/10.1117/12.2284075

Proceedings Article | 30 August 2017 Paper
Proceedings Volume 10321, 1032102 (2017) https://doi.org/10.1117/12.2284081

Proceedings Article | 30 March 2017 Presentation + Paper
Proceedings Volume 10148, 101480B (2017) https://doi.org/10.1117/12.2258056
KEYWORDS: Optical lithography, Optical proximity correction, Directed self assembly, Resolution enhancement technologies, Etching, Monte Carlo methods, Photomasks, Manufacturing, Metals, Logic, Visualization, Error analysis, Solids

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460B (2017) https://doi.org/10.1117/12.2258693
KEYWORDS: Monte Carlo methods, Stochastic processes, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, EUV optics, Lithography, Chemically amplified resists, Calibration, Edge roughness, Photoresist processing

Proceedings Article | 24 March 2017 Paper
Zhengqing John Qi, Jed Rankin, Lei Sun, Harry Levinson
Proceedings Volume 10143, 101431Y (2017) https://doi.org/10.1117/12.2258136
KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Stochastic processes, Scanning electron microscopy, Metrology

Proceedings Article | 24 March 2017 Paper
John Biafore, Azat Latypov, Anindarupa Chunder, Andy Brendler, Todd Bailey, Harry Levinson
Proceedings Volume 10143, 101432B (2017) https://doi.org/10.1117/12.2258707
KEYWORDS: Line edge roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Optimization (mathematics), Stochastic processes, Photoresist materials, Edge roughness, Photoresist processing, Critical dimension metrology, Diffusion, Diffractive optical elements, Tolerancing

SPIE Journal Paper | 29 September 2016
JM3, Vol. 15, Issue 03, 031610, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031610
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Proceedings Article | 22 March 2016 Paper
Proceedings Volume 9777, 97770N (2016) https://doi.org/10.1117/12.2219505
KEYWORDS: Optical lithography, Semiconducting wafers, Lithography, Directed self assembly, Immersion lithography, Extreme ultraviolet, Optical resolution, Neck, Modulation, Photomasks, Lens design, Ions, Neodymium, Visualization, Code division multiplexing

Proceedings Article | 18 March 2016 Open Access Paper
Proceedings Volume 9776, 977601 (2016) https://doi.org/10.1117/12.2236038
KEYWORDS: Lithography, Resolution enhancement technologies, Semiconducting wafers, Optical proximity correction, Extreme ultraviolet lithography, Optical lithography, Photomasks, Extreme ultraviolet, Deep ultraviolet, Head-mounted displays

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963502 (2015) https://doi.org/10.1117/12.2203117
KEYWORDS: Photomasks, Optical lithography, Extreme ultraviolet lithography, Lithography, Process control, Transistors, Reticles, SRAF, Optical proximity correction, Extreme ultraviolet

Proceedings Article | 5 September 2014 Paper
Proceedings Volume 9189, 91890E (2014) https://doi.org/10.1117/12.2060976
KEYWORDS: Lithography, Analog electronics, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Double patterning technology, Extreme ultraviolet, Free electron lasers, Digital electronics, Gas lasers

SPIE Journal Paper | 17 December 2013 Open Access
JM3, Vol. 12, Issue 04, 042001, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.042001
KEYWORDS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8886, 888602 (2013) https://doi.org/10.1117/12.2030193
KEYWORDS: Lithography, Double patterning technology, Optical lithography, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Transistors, Immersion lithography, SRAF, Directed self assembly

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792Q (2013) https://doi.org/10.1117/12.2011197
KEYWORDS: Line edge roughness, Photomasks, Stochastic processes, Semiconducting wafers, Critical dimension metrology, Calibration, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867916 (2013) https://doi.org/10.1117/12.2015829
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Reticles, Mask making, Defect inspection, Ions, Scanners, Lithography

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 852219 (2012) https://doi.org/10.1117/12.964292
KEYWORDS: Photomasks, Photovoltaics, Optical proximity correction, Lithography, Electromagnetism, SRAF, Optical lithography, Nanoimprint lithography, Diffraction, Printing

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83221M (2012) https://doi.org/10.1117/12.916171
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Deep ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Critical dimension metrology, Printing, Monte Carlo methods

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 832229 (2012) https://doi.org/10.1117/12.915868
KEYWORDS: Printing, Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Photomasks, Lithographic illumination, Double patterning technology, Line edge roughness, Metals

Proceedings Article | 15 March 2012 Paper
Proceedings Volume 8325, 83250D (2012) https://doi.org/10.1117/12.916952
KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Oxides, Photoresist processing, Critical dimension metrology, Chemical reactions, Fermium, Frequency modulation, Scanning electron microscopy

Proceedings Article | 15 March 2012 Paper
Yuangsheng Ma, Jason Sweis, Hidekazu Yoshida, Yan Wang, Jongwook Kye, Harry Levinson
Proceedings Volume 8327, 832706 (2012) https://doi.org/10.1117/12.917775
KEYWORDS: Double patterning technology, Photomasks, Optical lithography, Silicon, Critical dimension metrology, Standards development, Electronic design automation, Metals, Capacitance, Extreme ultraviolet

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 83262P (2012) https://doi.org/10.1117/12.918080
KEYWORDS: Lithography, Source mask optimization, Photomasks, Etching, Double patterning technology, Semiconducting wafers, Optical proximity correction, Optical lithography, Printing, Lithographic illumination

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7973, 79730H (2011) https://doi.org/10.1117/12.879793
KEYWORDS: Double patterning technology, Optical lithography, Lithography, Metals, Resolution enhancement technologies, Source mask optimization, Manufacturing, Logic, Immersion lithography, Extreme ultraviolet lithography

Proceedings Article | 4 April 2011 Paper
Yuangsheng Ma, Jason Sweis, Chris Bencher, Yunfei Deng, Huixiong Dai, Hidekazu Yoshida, Bimal Gisuthan, Jongwook Kye, Harry Levinson
Proceedings Volume 7974, 79740D (2011) https://doi.org/10.1117/12.879846
KEYWORDS: Double patterning technology, Semiconducting wafers, Logic, Optical lithography, Etching, Metals, Back end of line, Neodymium, Standards development, Scanning electron microscopy

Proceedings Article | 23 March 2011 Paper
Ryoung-Han Kim, Chiew-seng Koay, Sean Burns, Yunpeng Yin, John Arnold, Christopher Waskiewicz, Sanjay Mehta, Martin Burkhardt, Matthew Colburn, Harry Levinson
Proceedings Volume 7973, 79730N (2011) https://doi.org/10.1117/12.881701
KEYWORDS: Double patterning technology, Back end of line, Metals, Lithography, Etching, Logic, Dielectrics, Optical lithography, Front end of line, Scanning electron microscopy

SPIE Journal Paper | 1 October 2010
JM3, Vol. 9, Issue 04, 041211, (October 2010) https://doi.org/10.1117/12.10.1117/1.3504697
KEYWORDS: Resistance, Lithography, TCAD, Manufacturing, Design for manufacturability, Line edge roughness, Instrument modeling, Optical lithography, Edge roughness, Critical dimension metrology

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 76410T (2010) https://doi.org/10.1117/12.848387
KEYWORDS: Photomasks, Optical lithography, Etching, Dielectrics, Double patterning technology, Image processing, Logic, Scanning electron microscopy, Back end of line, Metals

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 76410D (2010) https://doi.org/10.1117/12.846654
KEYWORDS: Resistance, Lithography, TCAD, Optical lithography, Line edge roughness, Critical dimension metrology, Manufacturing, Device simulation, Edge roughness, Optical proximity correction

Proceedings Article | 13 March 2010 Paper
Proceedings Volume 7640, 76400T (2010) https://doi.org/10.1117/12.848183
KEYWORDS: Line width roughness, Lithography, Extreme ultraviolet, Etching, Scanning electron microscopy, Nanoimprint lithography, Line edge roughness, Image processing, Photoresist processing, Directed self assembly

Proceedings Article | 11 March 2010 Paper
Proceedings Volume 7640, 76401J (2010) https://doi.org/10.1117/12.848865
KEYWORDS: Source mask optimization, Lithography, Photomasks, Printing, Optimization (mathematics), Logic, Photoresist processing, Process modeling, 3D modeling, Optical lithography

Proceedings Article | 4 March 2010 Paper
Ryoung-Han Kim, Erin Mclellan, Yunpeng Yin, John Arnold, Sivananda Kanakasabapathy, Sanjay Mehta, Yuansheng Ma, Martin Burkhardt, Jason Cain, Greg McIntyre, Matthew Colburn, Harry Levinson
Proceedings Volume 7640, 76400F (2010) https://doi.org/10.1117/12.846698
KEYWORDS: Double patterning technology, Critical dimension metrology, Image processing, Photoresist processing, Lithography, Photomasks, Etching, Optical lithography, Scanning electron microscopy, Logic

SPIE Journal Paper | 1 January 2010
JM3, Vol. 9, Issue 01, 013001, (January 2010) https://doi.org/10.1117/12.10.1117/1.3302125
KEYWORDS: Resolution enhancement technologies, Lithography, Printing, Optical lithography, Image processing, Optical proximity correction, Polarization, Transistors, Line edge roughness, Photoresist processing

SPIE Journal Paper | 1 January 2010
JM3, Vol. 9, Issue 01, 019802, (January 2010) https://doi.org/10.1117/12.10.1117/1.3322187

SPIE Journal Paper | 1 October 2009
JM3, Vol. 8, Issue 04, 041501, (October 2009) https://doi.org/10.1117/12.10.1117/1.3273965
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photomasks, Line edge roughness, Lithography, Light sources, Optics manufacturing, Integrated circuits, Deep ultraviolet

Proceedings Article | 1 April 2009 Paper
Thomas Wallow, Junyan Dai, Charles Szmanda, Hiram Cervera, Chi Truong, Nikolaos Bekiaris, Jong-Wook Kye, Ryoung-Han Kim, Harry Levinson, Glen Mori
Proceedings Volume 7273, 72730D (2009) https://doi.org/10.1117/12.814468
KEYWORDS: Photoresist processing, Semiconducting wafers, Double patterning technology, Ultraviolet radiation, Photoresist materials, Image processing, Optical lithography, Lithography, Fourier transforms, Antireflective coatings

Proceedings Article | 1 April 2009 Paper
Thomas Wallow, Mahidhar Rayasam, Masanori Yamaguchi, Yohei Yamada, Karen Petrillo, Kenji Yoshimoto, Jongwook Kye, Ryoung-Han Kim, Harry Levinson
Proceedings Volume 7273, 727309 (2009) https://doi.org/10.1117/12.814474
KEYWORDS: Double patterning technology, Photoresist materials, Finite element methods, Scanning electron microscopy, Photoresist processing, Metrology, Etching, Lithography, Ultraviolet radiation, Photoresist developing

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727119 (2009) https://doi.org/10.1117/12.814953
KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Diffusion, Lithographic illumination, Photomasks, Image processing, Semiconducting wafers

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742X (2009) https://doi.org/10.1117/12.814277
KEYWORDS: Resolution enhancement technologies, Lithography, Optical lithography, Image processing, Transistors, Printing, Optical proximity correction, Photoresist processing, Design for manufacturing, Process control

SPIE Journal Paper | 1 January 2009
JM3, Vol. 8, Issue 01, 011010, (January 2009) https://doi.org/10.1117/12.10.1117/1.3094746
KEYWORDS: Double patterning technology, Photoresist materials, Finite element methods, Photoresist processing, Scanning electron microscopy, Etching, Lithography, Optical lithography, Ultraviolet radiation, Image analysis

Proceedings Article | 15 April 2008 Paper
Nikolaos Bekiaris, Hiram Cervera, Junyan Dai, Ryoung-han Kim, Alden Acheta, Thomas Wallow, Jongwook Kye, Harry Levinson, Thomas Nowak, James Yu
Proceedings Volume 6923, 692321 (2008) https://doi.org/10.1117/12.774205
KEYWORDS: Photoresist processing, Photoresist materials, Double patterning technology, Ultraviolet radiation, Floods, Lithography, Semiconducting wafers, Optical lithography, Coating, Printing

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69241J (2008) https://doi.org/10.1117/12.772711
KEYWORDS: Critical dimension metrology, Line edge roughness, Photomasks, Semiconducting wafers, Image processing, Diffusion, Lithography, Light scattering, Optical lithography, Photoresist processing

Proceedings Article | 26 March 2008 Paper
Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word
Proceedings Volume 6921, 69210P (2008) https://doi.org/10.1117/12.772933
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Transistors, Extreme ultraviolet, Optical proximity correction, Photoresist processing, Etching, Metals, Scanners

Proceedings Article | 11 April 2007 Paper
Proceedings Volume 6519, 651919 (2007) https://doi.org/10.1117/12.712319
KEYWORDS: Line edge roughness, Etching, Photoresist materials, Spatial frequencies, Lithography, Smoothing, Image processing, Critical dimension metrology, Semiconducting wafers, Photoresist processing

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 651824 (2007) https://doi.org/10.1117/12.712388
KEYWORDS: Critical dimension metrology, Line edge roughness, Fractal analysis, Etching, Monte Carlo methods, Scanning electron microscopy, Transistors, Line width roughness, Fourier transforms, Spatial frequencies

Proceedings Article | 4 April 2007 Paper
Chandra Saru Saravanan, Srinivasan Nirmalgandhi, Oleg Kritsun, Alden Acheta, Richard Sandberg, Bruno La Fontaine, Harry Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici
Proceedings Volume 6518, 651806 (2007) https://doi.org/10.1117/12.712470
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Scatterometry, Finite element methods, Monochromatic aberrations, Reticles, Cadmium, Fused deposition modeling, Mathematical modeling

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200Y (2007) https://doi.org/10.1117/12.711336
KEYWORDS: Polarization, Apodization, Pellicles, Transmittance, Matrices, Reticles, Jones matrices, Lithography, Critical dimension metrology, Zernike polynomials

Proceedings Article | 26 March 2007 Paper
Oleg Kritsun, Bruno La Fontaine, Richard Sandberg, Alden Acheta, Harry Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici, Chandra Saravanan, Kunie Primak, Rahul Korlahalli, Srinivasan Nirmalgandhi
Proceedings Volume 6520, 65200L (2007) https://doi.org/10.1117/12.715971
KEYWORDS: Semiconducting wafers, Scanners, Scatterometry, Critical dimension metrology, Metrology, Lithography, Modulation transfer functions, Cadmium, Spatial frequencies, Immersion lithography

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65202M (2007) https://doi.org/10.1117/12.713209
KEYWORDS: Photomasks, Double patterning technology, Line edge roughness, Lithography, Photoresist materials, Etching, Optical lithography, Scanning electron microscopy, Image resolution, Resolution enhancement technologies

Proceedings Article | 22 March 2007 Paper
Thomas Wallow, Marina Plat, Zhanping Zhang, Brian MacDonald, Joffre Bernard, Jeremias Romero, Bruno La Fontaine, Harry Levinson
Proceedings Volume 6519, 65190T (2007) https://doi.org/10.1117/12.712338
KEYWORDS: Photoresist materials, Ions, Lithography, Image resolution, Chemical analysis, Bismuth, Photoresist processing, Photoresist developing, Raster graphics, Lead

SPIE Journal Paper | 1 July 2006
JM3, Vol. 5, Issue 03, 033001, (July 2006) https://doi.org/10.1117/12.10.1117/1.2358129
KEYWORDS: Polarization, Dielectric polarization, Monte Carlo methods, Optical lithography, Lithography, Zernike polynomials, Jones matrices, Semiconducting wafers, Optical spheres, Dielectrics

SPIE Journal Paper | 1 April 2006
JM3, Vol. 5, Issue 02, 023001, (April 2006) https://doi.org/10.1117/12.10.1117/1.2200675
KEYWORDS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615318 (2006) https://doi.org/10.1117/12.652206
KEYWORDS: Line edge roughness, Etching, Photoresist processing, Photoresist materials, Scanning electron microscopy, Image processing, Image quality, Nickel, Semiconducting wafers, Optical lithography

Proceedings Article | 22 March 2006 Open Access Paper
Proceedings Volume 6151, 615101 (2006) https://doi.org/10.1117/12.663785
KEYWORDS: Nanotechnology, Immersion lithography, Water, Lithography, Semiconductors, Semiconducting wafers, Photoresist developing, Thin film coatings, Scanners, Photoresist materials

Proceedings Article | 22 March 2006 Paper
Proceedings Volume 6151, 61510A (2006) https://doi.org/10.1117/12.652212
KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Etching, Extreme ultraviolet lithography, Printing, Multilayers, Metrology, Scanning electron microscopy, Lithography

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 61544F (2006) https://doi.org/10.1117/12.657155
KEYWORDS: Photomasks, Polarization, Critical dimension metrology, Diffraction, Refractive index, Phase shifts, Binary data, Lithographic illumination, Optical testing, Mineralogy

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61540E (2006) https://doi.org/10.1117/12.656864
KEYWORDS: Polarization, Apodization, Optical lithography, Matrices, Transform theory, Zernike polynomials, Birefringence, Polarizers, Amplifiers, Interfaces

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601188
KEYWORDS: Modulation transfer functions, Scanners, Light scattering, Lithography, Spatial frequencies, Scatterometry, Critical dimension metrology, Computer simulations, Semiconducting wafers, Optical microscopes

Proceedings Article | 12 May 2005 Paper
Ivan Lalovic, Nigel Farrar, Kazuhiro Takahashi, Eric Kent, Daniel Colon, German Rylov, Alden Acheta, Koji Toyoda, Harry Levinson
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601002
KEYWORDS: Light sources, Resolution enhancement technologies, Lithography, Image processing, Excimer lasers, Deep ultraviolet, Wavefronts, Photomasks, Lithographic illumination, Colorimetry

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289
KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

Proceedings Article | 24 May 2004 Open Access Paper
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.546916
KEYWORDS: Lithography, Overlay metrology, Metrology, Photomasks, Extreme ultraviolet, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Ions, Scatterometry

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.539074
KEYWORDS: Photomasks, Semiconducting wafers, Reflectors, Binary data, Extreme ultraviolet lithography, Multilayers, Critical dimension metrology, Reticles, Printing, Optical lithography

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537103
KEYWORDS: Line edge roughness, Image quality, Image processing, Chemically amplified resists, Critical dimension metrology, Photoresist processing, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Optical lithography

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518220
KEYWORDS: Reticles, Semiconducting wafers, Lithography, Modulation transfer functions, Reflectivity, Spatial frequencies, Critical dimension metrology, Chromium, Antireflective coatings, Scanners

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518259
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Reflectivity, Inspection, Reflectors, Lithography, Image processing

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485510
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Image processing, Lithography, Manufacturing, Tolerancing, Nanoimprint lithography, Image quality, Control systems

Proceedings Article | 26 June 2003 Paper
Bruno La Fontaine, Jan Hauschild, Mircea Dusa, Alden Acheta, Eric Apelgren, Marc Boonman, Jouke Krist, Ashok Khathuria, Harry Levinson, Anita Fumar-Pici, Marco Pieters
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485535
KEYWORDS: Semiconducting wafers, Scanners, Etching, Silicon, Metrology, Lithography, Thin films, Computer simulations, Overlay metrology, Polishing

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484986
KEYWORDS: Photomasks, Extreme ultraviolet, Binary data, Multilayers, Extreme ultraviolet lithography, Optical lithography, Near field, Etching, Phase shifts, Chromium

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474598
KEYWORDS: Modulation transfer functions, Point spread functions, Spatial frequencies, Photomasks, Scanners, Modulation, Lithography, Light scattering, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474532
KEYWORDS: Monochromatic aberrations, Lithography, Reticles, Zernike polynomials, Wavefronts, Resolution enhancement technologies, Lenses, Semiconducting wafers, Lithographic lenses, Optical lithography

Proceedings Article | 30 July 2002 Paper
Bruno La Fontaine, Mircea Dusa, Jouke Krist, Alden Acheta, Jongwook Kye, Harry Levinson, Carlo Luijten, Craig Sager, Jack Thomas, Judith van Praagh
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474581
KEYWORDS: Semiconducting wafers, Error analysis, Reticles, Lithography, Scanners, Calibration, Prototyping, Sensors, Monochromatic aberrations, Image processing

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473477
KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Wafer-level optics, Etching, Optical testing, Metrology, Reticles, Scanners, Manufacturing

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435664
KEYWORDS: Critical dimension metrology, Monochromatic aberrations, Lithographic illumination, Lithography, Photomasks, Zernike polynomials, Lenses, Semiconducting wafers, Lithographic lenses, Phase measurement

Proceedings Article | 22 August 2001 Paper
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436789
KEYWORDS: Ions, Scanning electron microscopy, Resistance, Silicon, Optical lithography, Lithography, Annealing, Diffusion, Data acquisition, Niobium

Proceedings Article | 2 November 2000 Paper
Proceedings Volume 4099, (2000) https://doi.org/10.1117/12.405806
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Reticles, Optical lithography, Phase shifts, Diffraction, Electrons, Silicon, Wafer-level optics

Proceedings Article | 21 July 2000 Paper
Christopher Pike, Scott Bell, Marina Plat, Paul King, Khanh Nguyen, Christopher Lyons, Harry Levinson, Khoi Phan, Uzodinma Okoroanyanwu
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390068
KEYWORDS: Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Lithography, Etching, Manufacturing, Silicon, Inspection, Transistors, Photoresist materials

Proceedings Article | 19 July 2000 Paper
Harry Levinson, Paul Ackmann, Lori Peters, John Arnaud
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392048
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Scanners, Lithography, Binary data, Manufacturing, Defect inspection, Phase shifts, Inspection

Proceedings Article | 5 July 2000 Paper
Jeff Schefske, Eric Kent, Uzodinma Okoroanyanwu, Harry Levinson, Charles Masud, Bob Streefkerk, Ralph Hanzen, Joerg Brueback
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389035
KEYWORDS: 193nm lithography, Stray light, Semiconducting wafers, Chlorine, Reliability, Lithography, Optical components, Pulsed laser operation, Reticles, Sensors

Proceedings Article | 5 July 2000 Paper
Uzodinma Okoroanyanwu, Harry Levinson, Chih-Yuh Yang, Suzette Pangrle, Jeff Schefske, Eric Kent
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389030
KEYWORDS: Etching, Lithography, Optical lithography, Reflectivity, Photoresist processing, Semiconducting wafers, Absorption, Photomasks, Scanning electron microscopy, Manufacturing

Proceedings Article | 2 June 2000 Paper
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386536
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Lithography, Scanning electron microscopy, 193nm lithography, Binary data, Optical proximity correction, Antimony, Scanners

Proceedings Article | 2 June 2000 Paper
Uzodinma Okoroanyanwu, Harry Levinson, Jeremias Romero, Bhanwar Singh, Shih-Jung Lee
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386537
KEYWORDS: Absorption, Critical dimension metrology, Lithography, Process control, Reflectivity, Silicon, Optical lithography, Photoresist materials, Semiconducting wafers, Refractive index

Proceedings Article | 2 June 2000 Paper
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386482
KEYWORDS: Photoresist processing, Polymers, Photoresist materials, Semiconducting wafers, Lithography, Scanning electron microscopy, Photoresist developing, Optical lithography, Coating, Defect inspection

Proceedings Article | 14 June 1999 Paper
Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350834
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Inspection, Lithography, Manufacturing, Lenses, Optical lithography, Critical dimension metrology, Optical proximity correction

SPIE Press Book | 12 March 1999
KEYWORDS: Process control, Lithography

Proceedings Article | 7 July 1997 Paper
Harry Levinson, Moshe Preil, Patrick Lord
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275996
KEYWORDS: Error analysis, Semiconducting wafers, Reticles, Overlay metrology, Optical lithography, Control systems, Optical alignment, Lead, Statistical analysis, Process control

Proceedings Article | 1 July 1994 Paper
Lynda Hannemann-Mantalas, Harry Levinson
Proceedings Volume 10274, 102740E (1994) https://doi.org/10.1117/12.187456
KEYWORDS: Semiconductors, Process control, Semiconducting wafers, Overlay metrology, Lithography, Metrology, Optical lithography, Statistical methods, Wafer-level optics, Quartz

Proceedings Article | 1 May 1994 Paper
Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174151
KEYWORDS: Standards development, Microelectronics

Showing 5 of 120 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 13 March 2009

SPIE Conference Volume | 20 March 2008

SPIE Conference Volume | 9 March 2007

SPIE Conference Volume | 2 April 2006

Conference Committee Involvement (17)
40th European Mask and Lithography Conference (EMLC 2025)
16 June 2025 | Dresden, Germany
38th European Mask and Lithography Conference
19 June 2023 | Dresden, Germany
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
SPIE Advanced Lithography
21 February 2010 | San Jose, United States
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
SPIE Advanced Lithography
25 February 2007 | San Jose, United States
Optical Microlithography XIX
21 February 2006 | San Jose, California, United States
SPIE 31st International Symposium on Advanced Lithography
19 February 2006 | San Jose, United States
Optical Microlithography XVIII
1 March 2005 | San Jose, California, United States
Optical Microlithography XVII
24 February 2004 | Santa Clara, California, United States
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
Showing 5 of 17 Conference Committees
Course Instructor
SC111: Lithography Process Control
The class connects lithographic science to process control. Specific topics include: <br/> - Statistical process control, focusing on aspects particular to lithography <br/> - Efficient measurement sampling plans for achieving desired accuracy <br/> - Control issues specific to critical dimensions <br/> - Characterization and measurement of line-edge roughness (LER) <br/> - Control issues specific to overlay <br/> - Control issues specific to EUV lithography <br/> - Yield issues specific to lithography <br/> - Metrology for lithographic applications <br/> - Automatic process control <br/> - Control of operations <strong><br>Material level is intermediate. Some advanced topics are introduced.</strong>
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