Dr. Ching-Fen Kao Profile

Dr. Ching-Fen Kao

at MingDao Univ

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Author

Publications (8)

Proceedings Article | 28 December 2010 Paper

Reflective-type optical encoder based on fractional Talbot self-image effect using phase grating

Ching-Fen Kao, Sheng-Hua Lu

Proceedings Volume 7544, 75440N (2010) https://doi.org/10.1117/12.886238

KEYWORDS: Computer programming, Reflectivity, Optical encoders, Tolerancing, Light emitting diodes, Light sources, Collimation, Sensors, Moire patterns, Transmittance

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Proceedings Article | 2 August 2010 Paper

Multipoint gap measurement by low coherence tandem interferometry

Sheng-Hua Lu, Chi-Ying Chang, Ching-Fen Kao

Proceedings Volume 7791, 77910L (2010) https://doi.org/10.1117/12.858851

KEYWORDS: Interferometry, Interferometers, Camera shutters, Sensors, Light sources, Beam splitters, Spatial coherence, Michelson interferometers, Optical components, Fiber optics sensors

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Proceedings Article | 11 September 2007 Paper

Auto-scanning white-light interferometer

Jin-Liang Chen, Chi-Hong Tung, Ching-Fen Kao, Calvin Chang

Proceedings Volume 6672, 667204 (2007) https://doi.org/10.1117/12.733625

KEYWORDS: Beam splitters, Interferometers, Interferometry, Calibration, Charge-coupled devices, Light sources, Actuators, Image processing, 3D metrology, LCDs

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Proceedings Article | 14 August 2006 Paper

Fast surface profiling using monochromatic phase and fringe order in white-light interferometry

Chi-Hong Tung, Chiung-Huei Huang, Ching-Fen Kao, Calvin Chang

Proceedings Volume 6292, 62921F (2006) https://doi.org/10.1117/12.678899

KEYWORDS: Interferometry, Beam splitters, Light sources, Optical filters, Error analysis, Time metrology, Profiling, Mirrors, Objectives, Charge-coupled devices

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Proceedings Article | 31 August 2005 Paper

3D surface profilometry for both static and dynamic nanoscale full field characterization of AFM micro cantilever beams

Liang-Chia Chen, Kuang-Chao Fan, Chi-Duen Lin, Calvin Chang, Ching-Fen Kao, Jung-Tsung Chou

Proceedings Volume 5878, 587804 (2005) https://doi.org/10.1117/12.614683

KEYWORDS: Interferometry, Microelectromechanical systems, Light emitting diodes, 3D metrology, Atomic force microscopy, Light sources, Ferroelectric materials, Control systems, Light, Silicon

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SPIE Journal Paper | 1 February 2005

Double-diffraction planar encoder by conjugate optics

Ching-Fen Kao, Calvin Chang, Mao-Hong Lu

OE, Vol. 44, Issue 02, 023603, (February 2005) https://doi.org/10.1117/12.10.1117/1.1839227

KEYWORDS: Computer programming, Diffraction, Diffraction gratings, Tolerancing, Head, Optical engineering, Lutetium, Sensors, Doppler effect, Mirrors

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Proceedings Article | 2 August 2004 Paper

A white-light profiling algorithm adopting the multiwavelength interferometric technique

Hua-Chen Hsu, Chi-Hong Tung, Ching-Fen Kao, Calvin Chang

Proceedings Volume 5531, (2004) https://doi.org/10.1117/12.559251

KEYWORDS: Beam splitters, Interferometry, Light sources, Profiling, Phase interferometry, Interferometers, Phase shifts, Objectives, Actuators, Algorithm development

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Proceedings Article | 3 November 2003 Paper

Novel planar laser encoder system for two-dimensional positioning with ultrahigh head-to-scale alignment tolerance

Chyan-Chyi Wu, Calvin Chang, Ching-Fen Kao, Gwo-Sheng Peng

Proceedings Volume 5173, 517307 (2003) https://doi.org/10.1117/12.504442

KEYWORDS: Computer programming, Tolerancing, Diffraction gratings, Optical design, Optical alignment, Laser development, Diffraction, Interferometers, Polarization, Lithography

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Laser encoders overcome the fundamental resolution limit of geometrical optical encoders by cleverly converting the diffraction limit to phase coded information so as to facilitate nanometer displacement measurement. As positioning information is coded within the optical wavefront of laser encoders, interferometry principles must be adopted in the design of the laser encoders. This effect has posed a very strong alignment tolerance among various components of the whole laser encoder, which in turn imposes a serious user adaptation bottleneck. Out of all alignment tolerances, the head-to-scale alignment tolerance represents the most important hindrance for wider ap-plications. This paper presents a novel laser planar encoder, which serves as a two-dimensional position detection apparatus for precision machine applications and can provide a measuring resolution less than 1 nm. Improving the IBM laser optical encoder design by taking into consideration manufacturing tolerance of various optical components, an innovative two-dimensional laser encoder with ultra high head-to-scale tolerance is presented. It was identified that this newly proposed laser encoder design could avoid the effect of differences in polarization diffraction efficiencies for the 2-D grating scale used. Optimizing the system performance by cleverly designing the profile of the 2-D grating scale was also detailed. The effect of non-uniform temperature field within the head-to-scale range that can yield a nonzero initial phase so as to decrease the system measurement accuracy was analyzed. In addition, misalignment of the polarizers located in front the photodiodes were identified to be the main cause for imperfect Lissajous circles, which may lower the measuring resolution when traditional arctangent algorithm was adopted for circular polarization interferometers. The resolution of the newly developed laser planar encoder was verified by experiments and was found to agree well with the theoretical predictions.

Showing 5 of 8 publications

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