Dr. Ho-Chul Kim Profile

Dr. Ho-Chul Kim

at SAMSUNG Electronics Co Ltd

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Author

Publications (8)

Proceedings Article | 26 March 2008 Paper

Diffraction based overlay metrology for alpha-carbon applications

Chandra Saru Saravanan, Asher Tan, Prasad Dasari, Gary Goelzer, Nigel Smith, Seouk-Hoon Woo, Jang Ho Shin, Hyun Jae Kang, Ho Chul Kim

Proceedings Volume 6922, 69222W (2008) https://doi.org/10.1117/12.775811

KEYWORDS: Semiconducting wafers, Overlay metrology, Diffraction, Scatterometry, Spectroscopy, Diffraction gratings, Photomasks, Silicon, Reflectivity, Optical alignment

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Proceedings Article | 12 May 2005 Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598655

KEYWORDS: Fiber optic illuminators, Reticles, Semiconducting wafers, Image sensors, Photoresist materials, Overlay metrology, Optical lithography, Scanners, Optics manufacturing, Metrology

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Proceedings Article | 28 May 2004 Paper

A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Sook Lee, Chan Hwang, Dong-Woon Park, In-Sung Kim, Ho-Chul Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536280

KEYWORDS: Calibration, Lithography, Scanning electron microscopy, Data conversion, Refractive index, Device simulation, Diffusion, Scanners, Instrument modeling, Nanoimprint lithography

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Proceedings Article | 28 May 2004 Paper

Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Ho-Chul Kim, Dong-Seok Nam, Gi-Sung Yeo, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533373

KEYWORDS: Stray light, Scattering, Optical proximity correction, Light scattering, Critical dimension metrology, Optical testing, Electronics, Lithography, Chromium, Optical lithography

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Proceedings Article | 26 June 2003 Paper

Evaluation of ArF CLM in the sub-100-nm DRAM cell

Ju-Hyung Lee, Dong-Hoon Chung, Ho-Chul Kim, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485406

KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Manufacturing, Chlorine, Lithography, Scanners, Semiconducting wafers, Quartz, Scanning electron microscopy

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Proceedings Article | 26 June 2003 Paper

Layer-specific illumination optimization by Monte Carlo method

Ho-Chul Kim, Dong-Seok Nam, Chan Hwang, Young Kang, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485383

KEYWORDS: Monte Carlo methods, Lithographic illumination, Spectrum analysis, Resolution enhancement technologies, Critical dimension metrology, Lithography, Double patterning technology, Scanners, Image enhancement, Electronics

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Proceedings Article | 27 December 2002 Paper

Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Ju-Hyung Lee, Dong-Hoon Chung, Dong-Ho Cha, Ho-Chul Kim, Joon-Soo Park, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467504

KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Lithography, Scanners, Surface plasmons, Scanning electron microscopy, Manufacturing, Quartz, Semiconducting wafers

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Proceedings Article | 26 July 1999 Paper

Measurement of pitch dependency of overlay errors under OAI by using an electric CD measurement technique

Nakgeuon Seong, Hochul Kim, Hanku Cho, Joo-Tae Moon, Sang Min Lee

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354322

KEYWORDS: Overlay metrology, Optical lithography, Optical testing, Monochromatic aberrations, Critical dimension metrology, Scanners, Resistance, Error analysis, Double patterning technology, Phase measurement

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Showing 5 of 8 publications

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