Katsuhiko Wakana
at Gigaphoton Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 10 April 2024 Poster
Proceedings Volume PC12953, PC129530T (2024) https://doi.org/10.1117/12.3009787
KEYWORDS: Light sources, Semiconducting wafers, Vacuum chambers, Laser stabilization, Design and modelling, Acoustic waves, Power supplies, Power consumption, Optical components, Dose control

Proceedings Article | 10 April 2024 Poster
Proceedings Volume PC12953, PC129530U (2024) https://doi.org/10.1117/12.3009846
KEYWORDS: Telecommunications, Standards development, Machine learning, Light sources, Data analysis, Speckle, Semiconductor manufacturing, Optics manufacturing, Instrument modeling, Immersion lithography

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12953, PC129530C (2024) https://doi.org/10.1117/12.3009784
KEYWORDS: Scanners, Speckle, Deep ultraviolet, Yield improvement, Optical components, Semiconductors, Semiconducting wafers, Pulsed laser operation, Lithography, Line edge roughness

Proceedings Article | 14 April 2023 Poster
Proceedings Volume PC12494, PC124940J (2023) https://doi.org/10.1117/12.2658263
KEYWORDS: Light sources, Immersion lithography, Semiconductors, Optical components, Manufacturing, Electrodes

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11613, 116130D (2021) https://doi.org/10.1117/12.2583281
KEYWORDS: Light sources, Speckle, Yield improvement, Extreme ultraviolet lithography, Immersion lithography, Spatial coherence, Temporal coherence, Line width roughness, Optical lithography, Lithography

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10809, 108091M (2018) https://doi.org/10.1117/12.2500356
KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476
KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

Showing 5 of 7 publications
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