Kensuke Tsuchiya
at Sony Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 660732 (2007) https://doi.org/10.1117/12.729021
KEYWORDS: Optical proximity correction, Critical dimension metrology, Image processing, Lithography, Semiconductors, Optical calibration, Photomasks, Resolution enhancement technologies, Photoresist processing

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 660719 (2007) https://doi.org/10.1117/12.728957
KEYWORDS: Optical proximity correction, Metals, Design for manufacturing, Lithography, Manufacturing, Failure analysis, Yield improvement, Image processing, Error analysis, Photomasks

Proceedings Article | 20 May 2006 Paper
Mikio Oka, Shinichiro Suzuki, Kazuyoshi Kawahara, Kensuke Tsuchiya, Kazuhisa Ogawa, Hidetoshi Ohnuma
Proceedings Volume 6283, 628333 (2006) https://doi.org/10.1117/12.681821
KEYWORDS: Optical proximity correction, SRAF, Image processing, Lithography, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Photomasks, Printing, Semiconductors

Proceedings Article | 28 June 2005 Paper
Kensuke Tsuchiya, Kazuhisa Ogawa, Satomi Nakamura, Kazuyoshi Kawahara, Hidetoshi Oishi, Hidetoshi Ohnuma
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617135
KEYWORDS: Optical proximity correction, Photomasks, Metals, Printing, Semiconductors, SRAF, Lithography, Scanners, Design for manufacturing, Design for manufacturability

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557776
KEYWORDS: Data processing, Photomasks, Chemical elements, Error analysis, Finite element methods, Electron beam lithography, Distortion, Lithography, Computer simulations, Image processing

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