Tin sulfide (SnS) thin films of different thicknesses were deposited on TCO-coated glass substrates by pulse
electrodeposition. The applied potential pulses were -0.95V (Von) and +0.1V (Voff). Crystal structure of the deposited
films was orthorhombic with lattice parameters similar to that of the mineral herzenbergite. A systematic increase in the
band gap value was observed with increase in the film thickness. The dark conductivities of 60 and 510 nm thick films
were 3.8 x 10-8 Ω cm-1 and 6.72 x10-7 Ω cm-1 respectively. The structural parameters such as lattice constants and grain
size showed a systematic change with film thickness.
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