Mr. Nobuhiro Sato Profile

Nobuhiro Sato

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Proceedings Article | 9 April 2024 Presentation + Paper

Main chain scission resists towards high-NA EUV lithography

Akihide Shirotori, Yuji Oda, Rui Zhang, Kazunori Taguchi, Nobuhiro Sato, Sin Fu Yeh , Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12957, 129570P (2024) https://doi.org/10.1117/12.3009737

KEYWORDS: Extreme ultraviolet lithography, Lithography, Polymers, Extreme ultraviolet, Film thickness, Etching, Electron beam lithography, Optical lithography, Photoresist materials, Critical dimension metrology

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