Dr. Noriaki Oikawa
at Tokyo Electron Miyagi Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume PC12499, PC1249903 (2023) https://doi.org/10.1117/12.2658971
KEYWORDS: Photoresist materials, Etching, Extreme ultraviolet lithography, Printing, Bridges, Thin film coatings, Stochastic processes, Scanners, Oxides, Metals

Proceedings Article | 11 November 2022 Presentation
Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua LaRose, Jeffrey Shearer, Lior Huli, Philippe Foubert, Danilo De Simone
Proceedings Volume PC12292, PC122920N (2022) https://doi.org/10.1117/12.2642941
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Etching, Plasma etching, Lithography, Yield improvement, Stochastic processes, Plasma, Photoresist materials

Proceedings Article | 21 June 2022 Paper
Proceedings Volume PC12051, PC120510P (2022) https://doi.org/10.1117/12.2614165
KEYWORDS: Etching, Photoresist processing, Optical lithography, Stochastic processes, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, System on a chip, Metrology

Proceedings Article | 25 May 2022 Poster + Presentation + Paper
Hiroki Tadatomo, Arnaud Dauendorffer, Tomoya Onitsuka, Hisashi Genjima, Yasuyuki Ido, Soichiro Okada, Yuhei Kuwahara, Arisa Hara, Congque Dinh, Seiji Fujimoto, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Kenta Ono, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Blanco Victor, Philippe Foubert, Danilo De Simone
Proceedings Volume 12056, 120560F (2022) https://doi.org/10.1117/12.2614012
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Bridges, Extreme ultraviolet lithography, Inspection, Image processing

Proceedings Article | 28 September 2021 Presentation
Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert
Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Metals, Etching, Stochastic processes, Semiconductors, Semiconductor manufacturing, Resistance, Photomasks, Particles

Showing 5 of 7 publications
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