Dr. Yiyu Sun Profile

Dr. Yiyu Sun

at Beijing Institute of Technology

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Author

Publications (6)

Proceedings Article | 16 September 2022 Paper

Full field wavefront error aware source and mask optimization for extreme ultraviolet lithography

PengZhi Wei, YanQiu Li, ZhaoXuan Li, Zhen Li, YiYu Sun

Proceedings Volume 12325, 123250Q (2022) https://doi.org/10.1117/12.2640681

KEYWORDS: Source mask optimization, Extreme ultraviolet lithography, Wavefronts, Photomasks, Extreme ultraviolet, Point spread functions, Lithography, Optimization (mathematics), Computational lithography, Lens design

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Proceedings Article | 13 December 2021 Paper

Lithographic exposure latitude aware source and mask optimization

Lulu Zou, Lihui Liu, Yiyu Sun, Pengzhi Wei, Miao Yuan, Zhaoxuan Li, Yaning Li, Yanqiu Li

Proceedings Volume 12073, 1207302 (2021) https://doi.org/10.1117/12.2604844

KEYWORDS: Source mask optimization, Photomasks, Lithography, Resolution enhancement technologies, Semiconducting wafers, Lithium, Image processing, Electroluminescence, Optical proximity correction, Lithographic illumination

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Proceedings Article | 13 December 2021 Paper

Comprehensive and quantitative characterization and analysis method of 3D mask effect for lithography simulation

Enze Li, Yanqiu Li, Yang Liu, Yiyu Sun, Pengzhi Wei

Proceedings Volume 12073, 120730F (2021) https://doi.org/10.1117/12.2604846

KEYWORDS: Photomasks, Polarization, 3D modeling, Lithography, Projection systems, Analytical research, Fourier transforms

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Proceedings Article | 1 November 2021 Paper

Comparison of sparse-based full chip source optimization with different bases

Guanghui Liao, Lihui Liu, Yiyu Sun, Pengzhi Wei, Miao Yuan, Zhaoxuan Li, Yanqiu Li

Proceedings Volume 12057, 120570J (2021) https://doi.org/10.1117/12.2604075

KEYWORDS: Lithography, Resolution enhancement technologies, Optimization (mathematics), Optical lithography, Imaging systems

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Proceedings Article | 1 November 2021 Paper

Fast lithographic source pupil optimization using difference of convex functions algorithm for transformed L1 penalty

Yiyu Sun, Yanqiu Li, Guanghui Liao, Miao Yuan, Yang Liu, Yaning Li, Lulu Zou, Lihui Liu

Proceedings Volume 12057, 120570I (2021) https://doi.org/10.1117/12.2604052

KEYWORDS: Lithography, Optimization (mathematics), Algorithm development, Imaging systems, Zernike polynomials, Compressed sensing, Semiconducting wafers, Photomasks, Modulation, Lithium

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Proceedings Article | 1 November 2021 Paper

Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies

Yaning Li, Yanqiu Li, Yiyu Sun, Pengzhi Wei

Proceedings Volume 12057, 1205747 (2021) https://doi.org/10.1117/12.2606845

KEYWORDS: Lithography, Resolution enhancement technologies, Photomasks, Source mask optimization, Semiconducting wafers, Polarization, Systems modeling, Image processing, Image enhancement, Thermal effects

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Showing 5 of 6 publications

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