Dr. Young Jong Park Profile

Dr. Young Jong Park

Application Engineer at ASML Korea Co Ltd

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Author

Publications (5)

Proceedings Article | 20 March 2020 Presentation + Paper

Understanding advanced DRAM edge placement error budget and opportunities for control

Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon

Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

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Proceedings Article | 20 March 2020 Presentation + Paper

Taking the multi-wavelength DBO to the next level of accuracy and robustness

Jinsun Kim, Jeongijn Lee, Chan Hwang, Seung Yoon Lee, Wooyoung Jung, Joonsoo Park, Kaustuve Bhattacharyya, Arie den Boef, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Daniel Park, Kaustubh Padhye, Se-Ra Jeon, Seung-Bin Yang, Won-Jae Jang, Oh-Sung Kwon

Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676

KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

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Proceedings Article | 20 March 2020 Presentation + Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems

Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara

Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246

KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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Proceedings Article | 1 May 2018 Presentation + Paper

EUV contact-hole local CD uniformity optimization for DRAM storage node application

Mijung Lim, Chang-Moon Lim, Chang-Nam Ahn, Daniel Park, Anita Fumar-Pici, Nak Seong

Proceedings Volume 10583, 105830X (2018) https://doi.org/10.1117/12.2299322

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Stochastic processes, Diffraction, Compact discs, Diffraction gratings, Cadmium, Lithographic illumination

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Proceedings Article | 20 March 2018 Presentation + Paper

Smart overlay metrology pairing adaptive deep learning with the physics-based models used by a lithographic apparatus

Chan Hwang, Seung Yoon Lee, SeungHwa Oh, Emil Schmitt-Weaver, Jeonghyun Park, Daniel Park, Mohamed El Kodadi, Kaustuve Bhattacharyya

Proceedings Volume 10587, 105870B (2018) https://doi.org/10.1117/12.2297513

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Data modeling, Lithography, Optical alignment, Instrument modeling, Physics, Computing systems, Nanofabrication

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