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Yunjun Lu
at Shanghai Institute of Optics and Fine Mechanics
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Publications (5)
Proceedings Article | 24 November 2023 Paper
Simulation analysis of thermally induced deformation on reticle for deep ultraviolet lithography
Proceedings Volume 12935, 1293559 (2023) https://doi.org/10.1117/12.3008409
KEYWORDS: Reticles, Thermal deformation, Deformation, Light sources, Lithography, Optical gratings, Light sources and illumination, Deep ultraviolet, Integrating spheres, Glasses
SPIE Journal Paper | 11 March 2023
Fast measurement of wavefront aberration in double-grating Ronchi lateral shearing interferometry
OE, Vol. 62, Issue 03, 034105, (March 2023) https://doi.org/10.1117/12.10.1117/1.OE.62.3.034105
KEYWORDS: Phase shifts, Ronchi rulings, Wavefront errors, Wavefronts, Wavefront aberrations, Diffraction, Interferometry, Interferograms, Optical engineering, Optical gratings
SPIE Journal Paper | 14 December 2021
Measurement of the magnification and distortion of high-precision imaging system using dual-fiber point diffraction interferometer
Yisha Cao, Feng Tang, Xiangzhao Wang, Yang Liu, Peng Feng, Yunjun Lu, Fudong Guo
OE, Vol. 60, Issue 12, 124107, (December 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.12.124107
KEYWORDS: Distortion, Imaging systems, Reticles, Error analysis, Diffraction, Optical fibers, Wavefront aberrations, Point diffraction interferometers, Optical engineering, Nickel
SPIE Journal Paper | 31 May 2019
Measuring cone angle of axicon using scanning Fizeau interferometer
Yan Yan, Feng Tang, Xiangzhao Wang, Yunjun Lu, Fudong Guo
OE, Vol. 58, Issue 05, 054107, (May 2019) https://doi.org/10.1117/12.10.1117/1.OE.58.5.054107
KEYWORDS: Axicons, Interferometers, Fizeau interferometers, Calibration, Error analysis, Optical engineering, Distance measurement, Interferometry, Phase shifts, Light sources
Proceedings Article | 13 November 2014 Paper
A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror
Yunjun Lu, Feng Tang, Xiangzhao Wang, Yong Li, Xiulong Wan, Fudong Guo, Fengzhao Dai
Proceedings Volume 9276, 927617 (2014) https://doi.org/10.1117/12.2071824
KEYWORDS: Mirrors, Interferometers, Calibration, Surface finishing, Photovoltaics, Polishing, Semiconducting wafers, Spatial resolution, Optical testing, Lithography
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